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Improved light resistance pre-baking oven heating device

A heating device and pre-baking technology, applied in optics, nonlinear optics, instruments, etc., can solve problems such as poor baking effect, affecting the production quality of liquid crystal display devices, and maintaining uniform temperature

Inactive Publication Date: 2016-06-01
李东明
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Therefore, every process in the manufacturing process of the glass substrate is very delicate. Among them, after applying the photoresist, it needs to be baked to volatilize chemical substances such as the photosensitive agent and photoresist. At this time, please refer to figure 1 As shown, when the substrate 1 is baked, the substrate 1 is placed on the hot plate 11, and then the chemical substances on the surface of the substrate 1 are volatilized by the heat of the hot plate 11. During this process, the temperature is as high as about 70~ 150°C, and the heat source of the hot plate 11 comes from the heater 12 at the bottom, and the heater 12 is set under the hot plate 11 in 1 to 15 areas, so that the center, ring edge or end edge of the hot plate 11 can be kept as far as possible Balanced temperature, however, although the hot plate 11 has set 1 to 15 areas to control the temperature, it still cannot maintain a uniform temperature during the baking process, and the temperature of each adjacent area will interfere with each other, making the baking effect Poor, which affects the production quality of liquid crystal display devices

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Embodiment Construction

[0015] The following are examples, but the contents of the present invention are not limited to the scope of these examples.

[0016] An improved photoresist pre-baking furnace inner ring edge heater of the present invention, first of all, please refer to figure 2 and cooperate image 3 As shown, it is mainly composed of a cavity 2, a heater 21, a hot plate 22, a temperature sensor 23 and an inner ring edge heater 25. The cavity 2 is in the shape of a tank, and the bottom is a support base plate 201, and An upper cover plate 20 can be covered on the top surface to form a closed heating space. An inlet 203 is provided on one side of the cavity 2 for placing the glass substrate 3, and an air exhaust port 202 is opened on either side. And a heater 21 is provided above the support base plate 201, which can heat the hot plate 22 on the heater 21, and the hot plate 22 is divided into a plurality of small partitions 221, which are projected by a plurality of independent heaters 21 ...

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Abstract

The invention relates to an improved light resistance pre-baking oven heating device, in particular to a light resistance pre-baking oven inner ring edge heater applied to liquid crystal display (LCD) processing. Through the heating device on the inner side edge of a cavity, a heating area can be uniformly heated, and the product quality and production qualified rate are effectively improved. The improved light resistance pre-baking oven heating device mainly consists of a cavity, a heater, a hot plate, a temperature sensor and an inner ring edge heater. The cavity is in the shape of an accommodating groove, and a supporting base plate is arranged at the bottom of the cavity; the heater is positioned and arranged above the supporting base plate; the hot plate on the heater can be heated; the temperature sensor is arranged in the hot plate or the heater; the temperature in each area of the hot plate is detected, and the inner ring edge heater is arranged on the inner side of the cavity, so that the heating of the end edge of the hot plate can be strengthened, uniform temperature of the whole area of the hot plate is achieved, and a glass substrate put on the hot plate is uniformly baked.

Description

technical field [0001] The invention relates to an improved photoresist pre-baking furnace heating device, which uses an inner ring heater on the outer ring edge of the cavity to improve the insufficient heat at the end edge of the hot plate, so that the temperature of the hot plate can reach a uniform temperature. temperature. Background technique [0002] Press, the glass substrate is the main process raw material of liquid crystal display (TFT-LCD), also known as mother glass or plain glass, is a high-precision transparent electronic component, glass plays a role in the liquid crystal display (TFT-LCD) industry The role of the glass substrate is like a wafer in the semiconductor industry, so the liquid crystal display device (TFT-LCD) industry has almost perfect requirements for the surface precision of the glass substrate. [0003] Secondly, the manufacturing process of liquid crystal display device (TFT-LCD) is to use two alkali-free glass substrates respectively, cons...

Claims

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Application Information

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IPC IPC(8): G03F7/16G02F1/13
Inventor 李东明
Owner 李东明
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