Preparation method of insulated gate bipolar transistor
A bipolar transistor, insulated gate technology, used in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of complex process, slow switching speed, difficult threshold voltage control, etc., and achieve high anti-latch performance. , simplifies the structure, suppresses the effect of latch-up
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[0021] The specific implementation manners of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0022] A method for preparing an insulated gate bipolar transistor, comprising the steps of:
[0023] S1. Forming a p-type semiconductor substrate 50 having a doping concentration of impurities of a predetermined conductivity type;
[0024] S2. After growing the buried oxide layer 60 on the p-type substrate, forming an n-type epitaxial layer 70 on the buried oxide layer 60;
[0025] S3. Implanting p-type impurity ions on one side of the n-type epitaxial layer 70 to form a p- / p+ base region with a predetermined depth; implanting p-type impurity ions on the other side of the n-type epitaxial layer to form a base region with a predetermined depth. A p+ ring 90 of a predetermined depth; implanting n-type impurity ions into the p- / p+ base region to form an n+ region of a predetermined depth;
[0026] S4, forming a first gate and a ...
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