High-voltage flip chip structure and preparation method thereof
A flip-chip, high-voltage technology, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems that affect the reliability of LED chips, the temperature of LED chips rises, and the heat conduction and stability of LED chips have not been solved. Achieve the effects of avoiding waste of raw materials, increasing pad area, and reducing precision requirements
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[0043] The high-voltage flip-chip structure of the present invention has a structure such as image 3 As shown, a substrate 1, an N-type GaN layer 2, a quantum well active region 3, a P-type GaN layer 4, a light reflection layer 10 and a TiW barrier layer 20 are sequentially arranged from top to bottom, and the P-type GaN layer 4 is provided with There is a P electrode 5 , an N electrode 7 is arranged on the N-type GaN layer 2 , and a TiW barrier layer 20 is arranged on the light reflection layer 10 other than the P electrode 5 and the N electrode 7 . SiO is provided on the TiW barrier layer 20 2insulating layer 15. The bottoms of the P electrode 5 and the N electrode 7 are provided with an electrode metal layer 16, the electrode metal layer at the bottom of the P electrode 5 is provided with a P pole pad 18, and the electrode metal layer at the bottom of the N electrode 7 is provided with an N pole pad 19, Between the P pole pad 18 and the N pole pad 19, SiO 2 insulating l...
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