Preparation method of large-size Cu(100) single-crystal copper foil
A large-size, copper foil technology, applied in the field of preparation of large-size Cu single crystal copper foil, can solve the problems of reducing grain boundary density, etc., and achieve the effect of reducing preparation cost, low cost and simple method
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[0017] Embodiment one: a kind of method for annealing doped polycrystalline copper to prepare single crystal Cu (100), comprises the following steps:
[0018] (1), place the polycrystalline copper foil doped with the metal element flatly on the high temperature resistant substrate, put it into the chemical vapor deposition equipment, pass inert gas and H 2 Gas, the inert gas flow rate is 300~500sccm, H 2 Flow rate is 20~50sccm, then starts to heat up, and described inert gas is N 2 or Ar;
[0019] (2) When the temperature rises to 800~1100℃, H 2 Gas, H 2 The flow rate is 2-500 sccm, the annealing process is carried out, and the Cu(100) single crystal copper foil is obtained after the annealing is completed.
[0020] Carry out XRD characterization to the copper foil after above-mentioned annealing, the result is as follows figure 1 as shown in b. Depend on figure 1 b It can be seen that the front and back of the annealed copper foil have only one direction, that is, the ...
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