Micro-nanofabrication method of pdms elastomer based on cross-linking controlled transfer printing
A technology of micro-nano processing and controlled transfer, applied in the process of producing decorative surface effects, manufacturing micro-structure devices, micro-structure technology, etc., can solve the limited processing forms, limited micro-nano processing technology, difficult to prepare complex Surface pattern structure and other issues to achieve the effect of a wide range of applications
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Embodiment 1
[0016] Embodiment 1: prepare the PDMS membrane of surface patterning, the steps are as follows:
[0017] Step 1, using replica molding method to prepare PDMS with surface microstructure as a stamp for transfer printing: first, mix PDMS prepolymer and crosslinking agent Sylgard184 (purchased from Dow Corning, USA) in a mass ratio of 10:1, Stir well with a glass rod to form a uniform pre-polymer; after degassing the above-mentioned pre-polymer in a circulating water multi-purpose vacuum pump for 1 hour, pour it on a silicon formwork (ie, a master formwork) with a cylindrical array, and the pouring thickness is about 1mm; cured by heating at 70°C for 4h; carefully peel off the PDMS film on the silicon template to form a PDMS stamp, and the PDMS with surface microstructure prepared by the replication molding method (10:1) The surface structure of the stamp is as figure 1 shown.
[0018] Step 2, utilizing the pouring method to prepare a PDMS thick film with a thickness of about 1...
Embodiment 2
[0021] Embodiment 2: prepare the PDMS membrane of surface patterning, preparation process is basically the same as embodiment 1, the only difference is that the mass ratio of PDMS prepolymer and cross-linking agent in step 1 is changed to 20:1, and the mass ratio in step 2 is changed to 20:1. The mass ratio of PDMS prepolymer and cross-linking agent was changed to 10:1, that is, the cross-linking parameters were determined by PDMS (10:1) / PDMS (20:1) Change to PDMS (20:1) / PDMS (10:1) , the finally obtained PDMS membrane with a regular dot raised pattern on the surface is as follows image 3 The atomic force diagram of .
[0022] As above, by changing the cross-linking agent content in the preparation process, that is, the cross-linking parameters, such as: it can be PDMS (10:1) / PDMS (20:1) 、PDMS (10:1) / PDMS (30:1) 、PDMS (20:1) / PDMS (5:1) 、PDMS (20:1) / PDMS (10:1) any group in .
[0023] In summary, the method of the present invention mainly utilizes the differe...
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