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Cleaning agent for cleaning after solar photovoltaic cell silicon wafer texturization

A photovoltaic cell silicon wafer and cleaning agent technology, which is applied in detergent compositions, detergent compounding agents, surface active detergent compositions, etc. The effect of adhesion, improving corrosion factor, and convenient control

Active Publication Date: 2016-07-27
林淑录
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The gas oxidant is easy to volatilize, so it needs to be used first

Method used

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  • Cleaning agent for cleaning after solar photovoltaic cell silicon wafer texturization
  • Cleaning agent for cleaning after solar photovoltaic cell silicon wafer texturization

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A cleaning agent for cleaning silicon wafers of solar photovoltaic cells after texturing. The cleaning agent is composed of 100L agent A and 100L agent B. Agent A is made by dissolving 47L ozone in 100L ultrapure water, and agent B is made of saturated HNO 3 1.25L, 1.25L saturated HCl, 10g sodium perfluorosulfonate, 10g perfluorocarboxylic acid, and 100L ultrapure water.

Embodiment 2

[0027] A cleaning agent for cleaning silicon wafers of solar photovoltaic cells after texturing. The cleaning agent is composed of 100L agent A and 100L agent B. Agent A is made by dissolving 40L ozone in 100L ultrapure water, and agent B is made of saturated HNO 3 1L, 1L of saturated HCl, 5g of sodium perfluorosulfonate, 5g of perfluorocarboxylic acid, and 100L of ultrapure water.

Embodiment 3

[0029] A cleaning agent for cleaning silicon wafers of solar photovoltaic cells after texturing. The cleaning agent is composed of 100L of agent A and 100L of agent B. Agent A is made by dissolving 70L of chlorine gas in 100L of ultrapure water. 3 2.5L, 2.5L saturated HCl, 25g sodium perfluorosulfonate, 25g perfluorocarboxylic acid, and 100L ultrapure water.

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Abstract

The invention discloses a cleaning agent for cleaning after solar photovoltaic cell silicon wafer texturization.The cleaning agent is composed of an agent A and an agent B with the volume ratio being 1:1.The agent A is prepared from an oxidizing agent and ultrapure water.The agent B is prepared from acid, a fluorinated surfactant and ultrapure water.The mass percent of acid in the agent B is 1.0%-5.0%.The mass percent of the fluorinated surfactant in the agent B is 0.01%-0.05%.The agent A and the agent B are separated for use.The agent A or the agent B is used at first.When the agent A is used at first, the oxidizing agent of the agent A is a gas oxidizing agent.The volume percent of the gas oxidizing agent in the agent A is 40%-90%.The cleaning agent is good in cleaning effect and capable of removing stubborn dirt and metal attachments.

Description

technical field [0001] The invention relates to the field of industrial cleaning of high-precision electronic components, in particular to a cleaning agent for cleaning silicon wafers of solar photovoltaic cells after texturing. Background technique [0002] At present, the solar cell industry, which uses the photovoltaic effect principle of semiconductor devices to convert solar radiation energy into electrical energy, is developing very rapidly. All countries are implementing incentive policies and investing huge sums of money to support industrialization development. One of the important problems hindering its development is that the high manufacturing cost has caused the electricity price level to be unable to compete with other power generation methods, and it can be effectively achieved by preparing high-quality anti-reflection texture (texture) on the surface of the silicon substrate. Improving the photoelectric conversion efficiency of solar cells is a key means to s...

Claims

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Application Information

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IPC IPC(8): C11D1/37C11D1/12C11D3/60C11D3/04C11D3/02C30B33/08
CPCC11D1/004C11D1/04C11D1/12C11D3/02C11D3/042C11D3/046C30B33/08
Inventor 林淑录
Owner 林淑录