A low-temperature nano-hydrophobic vacuum discharge deposition coating method
A vacuum discharge and nano technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of performance degradation, becoming crispy and brittle, etc.
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Embodiment 1
[0048] The process of film coating of the present invention is realized by following process and step:
[0049] 1) Surface treatment steps:
[0050] 1a) Place the sample 3 to be coated on the sample stage 6 in the vacuum chamber body 5, and place the shielding net 9 at a height of 30-70mm above the sample 3, close the hatch and start the vacuum pump group 7 to vacuum until the vacuum display System 8 shows 40Pa;
[0051] 1b) Open O 2 (Oxygen, the supply pressure of the gas source should be 2-5kg / cm 2 ) solenoid valve 22 into oxygen, O 2 (oxygen) adjust the flow rate of mass flow meter 23 to be set to 5 sccm;
[0052] 1c) Pass O 2 Finally, the degree of vacuum will drop. After the degree of vacuum returns to 40Pa and becomes stable again, turn on the radio frequency power switch 13 and start the 13.56MHz radio frequency power source 12, and the power is set to 60W.
[0053] 1d) After 3 minutes, after the ion surface treatment is completed, turn off the O 2 Oxygen solenoi...
Embodiment 2
[0063] After test optimization and exploration, it is found that under the condition of other conditions unchanged, the power setting relationship of the two power sources is different when the coating film is formed. The hydrophobic ability of the film will have a significant difference. Angle, the larger the value, the stronger the hydrophobic ability) to measure. The relationship between the power matching and the hydrophobic angle of the film is shown in Table 1. Finally, it is obtained that the optimized power configuration is 120W for the 13.56MHz radio frequency power supply 12, and 40W for the 300MHz high frequency power supply 11.
[0064] Table 1 WCA(°)
[0065]
[0066] P1 is 13.56MHz RF power supply
[0067] P2 is 300MHz high-frequency power supply.
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