Nanoparticle space isolation atomic layer deposition equipment and method based on fluidized bed
An atomic layer deposition, nanoparticle technology, applied in nanotechnology, coating, gaseous chemical plating, etc., can solve the problem of long cleaning process, affecting the powder deposition coverage and coating uniformity, and affecting the nanoparticle deposition efficiency. and other problems, to achieve the effect of convenient operation, shortened time, equipment cleaning time, and good coating uniformity
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[0031] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.
[0032] The basic principle of the present invention is to put the powder into the powder reaction chamber of a special atomic layer deposition device, and the powder reaction chamber makes intermittent circular motions driven by the power source, and passes through the cleaning and reaction areas in turn to realize the whole process. The deposition process of the atomic layer, in which the precu...
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