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Nanoparticle space isolation atomic layer deposition equipment and method based on fluidized bed

An atomic layer deposition, nanoparticle technology, applied in nanotechnology, coating, gaseous chemical plating, etc., can solve the problem of long cleaning process, affecting the powder deposition coverage and coating uniformity, and affecting the nanoparticle deposition efficiency. and other problems, to achieve the effect of convenient operation, shortened time, equipment cleaning time, and good coating uniformity

Active Publication Date: 2016-09-21
HUAZHONG UNIV OF SCI & TECH
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Problems solved by technology

[0004] The traditional atomic layer deposition method can be directly applied on the surface of the substrate, which can get a good coating effect. However, for nanoparticles with too large specific surface area and high specific surface energy, traditional atomic layer deposition The method of coating will cause serious agglomeration, which affects the most critical coating rate and coating uniformity of powder deposition, and the traditional fluidized bed-based atomic layer deposition technology requires a high vacuum environment At the same time, the cleaning process is longer, which directly affects the efficiency of nanoparticle deposition

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[0031] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0032] The basic principle of the present invention is to put the powder into the powder reaction chamber of a special atomic layer deposition device, and the powder reaction chamber makes intermittent circular motions driven by the power source, and passes through the cleaning and reaction areas in turn to realize the whole process. The deposition process of the atomic layer, in which the precu...

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Abstract

The invention discloses nanoparticle space isolation atomic layer deposition equipment and a method based on a fluidized bed. Nanoparticles to be coated are put in a middle part of a powder reaction cavity; the middle part of the powder reaction cavity is driven to perform an intermittent peripheral motion under driving of a power supply to pass through a first cleaning area, an absorbing area, a second cleaning area and a reaction area in sequence; coating film layers are formed on the surfaces of the nanoparticles; and an ideal film thickness is obtained through circular motion. The equipment and the method can realize quick coating of the nanoparticles under normal pressure, and have such advantages as high coating rate, good coating uniformity and high coating efficiency.

Description

technical field [0001] The invention belongs to the technical field of powder atomic layer deposition, and more specifically relates to a fluidized bed-based atomic layer deposition equipment and method for spatial isolation of nanoparticles. Background technique [0002] With the superfineness of the material, the powder particles will show a series of microscopic effects, and show a series of excellent physical and chemical properties on the macroscopic level, but at the same time, the powder particles are easy to agglomerate, easy to be oxidized, and unstable in nature, etc. A series of disadvantages. By covering the surface of the powder particles with a protective layer, the above shortcomings can be effectively overcome, and the powder particles with a protective film can also be used as a new composite material with excellent performance. [0003] At present, the coating methods of powder particles mainly include solid-phase method, liquid-phase method and gas-phase ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C23C16/442C23C16/455B82Y40/00
CPCB82Y40/00C23C16/4417C23C16/442C23C16/45544
Inventor 陈蓉巴伟明
Owner HUAZHONG UNIV OF SCI & TECH
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