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A method for preparing micro-coaxial metal structures on metal substrates

A metal structure, coaxial technology, used in the manufacture of microstructure devices, microstructure technology, microstructure devices, etc., can solve the problems of large metal outer wall roughness, difficult center alignment, low verticality, etc., and achieve concise preparation steps. , low cost, excellent effect

Inactive Publication Date: 2017-08-25
HEFEI UNIV OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The purpose of the present invention is to provide a method for preparing a micro-coaxial metal structure on a metal substrate. The technical means adopted are UV-LIGA, micro-electroforming and micro-electroforming post-processing technology, and the metal shell is formed by one-time micro-electroforming. It can solve the problems of difficult center alignment, large metal outer wall roughness and low verticality existing in the current multi-layer continuous processing technology

Method used

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  • A method for preparing micro-coaxial metal structures on metal substrates
  • A method for preparing micro-coaxial metal structures on metal substrates

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Embodiment Construction

[0019] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0020] The object of the present invention is to provide a method for preparing a micro-coaxial metal structure on a metal substrate.

[0021] In order to make the above objects, features and advantages of the present invention more comprehensible, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0022] Such as figure 1 with figure 2 As shown, a method for preparing a m...

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Abstract

The invention discloses a method for preparing a micro coaxial metal structure on a copper substrate. The method comprises the following steps: firstly coating negative photoresist on the copper substrate, exposing and developing the negative photoresist layer via ultraviolet light under a mask to obtain a coating structure of a metal substrate layer, and carrying out micro electroforming to obtain the metal substrate layer; coating photoresist on the metal substrate layer, photoetching and developing the same to obtain a support body, coating the negative photoresist on the support body, and carrying out photoetching, developing and copper micro electroforming to obtain a metal inner shaft; stripping off all negative photoresist on the metal substrate to obtain a three-layer micro structure, coating the negative photoresist thereon, carrying out photoetching and developing to obtain the coating structure of an inverted U-shaped metal shell, electroforming metal copper on the coating structure, and stripping off the negative photoresist to obtain a micro coaxial structure. According to the method disclosed by the invention, a one-time micro electroforming molding method is adopted on the outer wall of the micro coaxial metal to solve the problems of the existing multilayer continuous processing craft that the centers are difficult to align, the roughness of the outer wall of the metal is large and that the verticality is low, the process steps are not only simplified, the processing period can be shortened, the processing difficulty can be reduced, and the processing cost is lowered.

Description

technical field [0001] The invention relates to the technical field of metal microstructure manufacture, in particular to a method for preparing a micro-coaxial metal structure on a metal substrate. Background technique [0002] In the microstructure, the microstructure obtained by very thin microprocessing on the base material is usually called a two-dimensional microstructure. For those microstructures that are simple in structure and do not contain curved surfaces or slopes, they are called quasi-three-dimensional microstructures, such as deep grooves and steps whose sidewalls are perpendicular to the surface. Only microstructures containing curved surfaces or arbitrary complex shapes are called three-dimensional microstructures. In MEMS (micro-electromechanical systems), in order to meet the requirements of function and assembly, many components need to have three-dimensional microstructures such as inclined surfaces and free-form surfaces, especially micro-coaxial stru...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00C25D1/00
CPCB81C1/00103C25D1/00
Inventor 阮久福张称宋哲董耘琪邓光晟杨军
Owner HEFEI UNIV OF TECH