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Array substrate and manufacturing method thereof, display panel and defect repairing method thereof

A technology for array substrates and display panels, applied in instruments, nonlinear optics, optics, etc., can solve problems such as bright and dark spot defects, high production costs, and low product yields, and achieve the effect of solving low product yields

Active Publication Date: 2019-12-17
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to solve the problem of low product yield and high production cost due to the existence of bright and dark spot defects in the prior art, an embodiment of the present invention provides an array substrate and its manufacturing method, a display panel and its defect repair method

Method used

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  • Array substrate and manufacturing method thereof, display panel and defect repairing method thereof
  • Array substrate and manufacturing method thereof, display panel and defect repairing method thereof
  • Array substrate and manufacturing method thereof, display panel and defect repairing method thereof

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Embodiment Construction

[0051]In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0052] figure 1 is a schematic structural view of an array substrate provided by an embodiment of the present invention, figure 2 can be figure 1 The top plan view of the array substrate shown, as figure 1 and figure 2 As shown, the array substrate includes:

[0053] Substrate substrate 11.

[0054] A gate metal pattern 12 is formed on the base substrate 11 , and the gate metal pattern 12 may include a gate 121 and a signal line 122 .

[0055] The signal lines in the gate metal pattern in the embodiment of the present invention are also called gate lines.

[0056] A source-drain metal pattern 13 is formed on the base substrate 11 formed with a gate metal pattern 12. The source-drain metal pattern 13 is insulated from the gate me...

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Abstract

The invention discloses an array substrate, a manufacturing method thereof, a display panel and a defect repair method of the display panel, and belongs to the field of manufacturing of liquid crystal panels. The array substrate comprises a lining substrate, wherein a grid metal pattern is formed on the lining substrate; the grid metal pattern comprises a grid and a signal line; a source-drain metal pattern is formed on the lining substrate on which the grid metal pattern is formed; the source-drain metal pattern is insulated from the grid metal pattern; the source-drain metal pattern comprises a source, a drain, a data line and a repair structure; the repair structure is electrically connected with the data line; an insulating layer and a pixel electrode are formed in sequence on the lining substrate on which the source-drain metal pattern is formed; the pixel electrode is electrically connected with the source or the drain; an overlapping region exists between positive projections of the pixel electrode and the repair structure on the lining substrate. By adopting the array substrate, the manufacturing method thereof, the display panel and the defect repair method of the display panel, repair of dark spots is realized, and the problems of low product yield and high production cost caused by bright and dark spots are solved.

Description

technical field [0001] The invention relates to the field of liquid crystal panel manufacturing, in particular to an array substrate and a manufacturing method thereof, a display panel and a defect repairing method thereof. Background technique [0002] A liquid crystal display (English: Liquid Crystal Display; LCD for short) is a commonly used display device. During the production process, bright and dark point defects often appear on the LCD display panel. Bright and dark spots are a common defect in display panels, and the processing cost is extremely high, which increases the production cost. Therefore, the improvement of bright and dark spot defects has become a widely concerned issue. [0003] The improvement of bright and dark spot defects in the prior art mainly realizes the improvement of bright spots into dark spots. The specific method is: use laser (laser) to cut off the polysilicon active layer (English: Polycrystal Silicon; abbreviation: P-Si), and turn brig...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1362
CPCG02F1/136259G02F1/136272
Inventor 杨璐王文涛司晓文徐海峰王金锋闫雷姚磊武新国
Owner BOE TECH GRP CO LTD