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Technological treatment method and device

A treatment method and a treatment device technology, applied in metal material coating technology, gaseous chemical plating, coating, etc., can solve the problem of affecting the coating effect of silicon wafers, reducing the surface smoothness of graphite boats, and reducing the uniformity of silicon wafer coatings And other problems, to achieve the same thickness, maintain the refractive index, the effect of consistent refractive index

Inactive Publication Date: 2016-12-21
JIANGXI RISUN SOLAR ENERGY CO LTD
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  • Claims
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Problems solved by technology

However, graphite boats are used as the carrier for solar cells to be coated with anti-reflection coatings. As the number of uses increases, a layer of silicon nitride film will gradually be deposited on the surface of the graphite boats in the graphite boats, making the surface of the graphite boats smoother. Reduce, affect the coating effect of silicon wafers, reduce the uniformity of silicon wafer coating

Method used

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Embodiment Construction

[0036] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. The components of the embodiments of the invention generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations. Accordingly, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts belong to the protection scope of the present invention.

[0037] It should be noted that like numerals and let...

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Abstract

The invention provides a technological treatment method and device applicable to a film plating system using graphite boat for film plating on silicon chips. The method includes: determining the marks of graphite boats needing film plating; in the film plating system, presetting the used number of times of all graphite boats according to the marks of the graphite boats; determining the used number of times of the graphite boats according to the marks; determining the special gas flow parameters and film plating time parameters in the film plating process according to the used number of times of the graphite boats; and conducting film plating according to the special gas flow parameters and film plating time parameters. When the graphite boats are employed to perform film plating operation on silicon chips, the special gas flow parameters and film plating time parameters can be determined according to the used number of times of the graphite boats, the graphite boats with different used numbers of times adopt different special gas flows and film plating time. Even if the surface smoothness of graphite boat sheets in the graphite boats is reduced, the film plating effect of the silicon chips is not affected, the film formed on the silicon chip has consistent thickness and consistent refractivity, and the silicon chip film coating effect is more unified.

Description

technical field [0001] The invention relates to the field of solar equipment manufacturing, in particular, to a processing method and device. Background technique [0002] In the production and processing of solar silicon wafers, PECVD (Plasma Enhanced Chemical Vapor Deposition, Plasma Enhanced Chemical Vapor Deposition) process is used for coating, which is used to improve the conversion rate of silicon wafers to solar energy. In this process, a graphite boat is used. The silicon wafer is placed in the graphite boat, and a chemical reaction occurs under certain conditions, and a film is coated on the surface of the silicon wafer. [0003] When using chemical gas coating, the gas flow rate and coating time used each time are fixed. However, graphite boats are used as the carrier for solar cells to be coated with anti-reflection coatings. As the number of uses increases, a layer of silicon nitride film will gradually be deposited on the surface of the graphite boats in the g...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/52
CPCC23C16/52
Inventor 王广伟熊大明柳恒
Owner JIANGXI RISUN SOLAR ENERGY CO LTD
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