Method for machining wafer
A processing method and wafer technology, applied in the direction of stone processing equipment, fine working devices, manufacturing tools, etc., can solve the problems of device side damage and cutting edge deflection, and achieve the effect of eliminating damage and rotating stability.
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[0028] Hereinafter, preferred embodiments of the wafer processing method of the present invention will be described in detail with reference to the drawings.
[0029] figure 1 A perspective view of a semiconductor wafer as a wafer processed according to the invention is shown in . figure 1 The shown semiconductor wafer 2 is composed of a silicon wafer with a thickness of, for example, 600 μm, and a plurality of planned dividing lines 21 are formed in a grid pattern on the front surface 2 a, and formed in a plurality of regions divided by the plurality of planned dividing lines 21 . Devices such as ICs and LSIs 22 . All the devices 22 have the same structure. A plurality of bumps 23 as protruding electrodes are respectively formed on the front surfaces of the devices 22 . Hereinafter, a wafer processing method in which the semiconductor wafer 2 is divided into individual devices 22 along the planned dividing line 21 and the respective devices are coated with resin will be de...
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