Semiconductor avalanche photoelectric detector using a low dimensional quantum dot multiplication layer
An avalanche optoelectronic and quantum dot layer technology, which is applied in the direction of semiconductor devices, circuits, electrical components, etc., can solve the problems of low device reliability, complicated preparation process, and large dark current, and achieve improved avalanche gain, less kinetic energy loss, and acoustic The effect of sub-scattering suppression
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[0038] The purpose of this embodiment is to use InAs quantum dots as multiplier materials to improve the gain coefficient of GaAs APD and reduce its excess noise. The device is a mesa junction structure, adopts the basic structure of absorption multiplication and separation, uses electrons as multiplied carriers, and uses P + -P - -P +- P - -N + The doped structure of the device material is grown using a molecular beam epitaxy system. The feasibility of the present invention is verified by comparing with a control device without quantum dot multiplication. The specific device structures of quantum dot multiplication and non-quantum dot multiplication APD are as follows: figure 2 Shown left and right. Both device structure parameters are identical except for the multiplication region. Its structure contains the following materials in order from bottom to top:
[0039] ① Semi-insulating (S.I.) GaAs (001) substrate. The thickness is 350 microns, and the resistivity ρ≥1M...
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