Optical element six-degree-of-freedom micro-displacement adjustment device, projection objective lens and lithography machine

Abstract

The invention provides an optical element's six-degree-of-freedom micro-displacement adjusting device, which comprises a lens barrel and three adjusting branch chains arranged on the upper surface of the lens barrel wherein each adjusting branch chain provides displacement adjustment of two degrees of freedom. The support frame is mounted on the upper surface of the three adjusting branch chains, and can be displaced in two degrees of freedom driven by each adjusting branch chain. An optical element is fixed in the support frame, and achieves six-degree-of-freedom displacement adjustment driven by the three adjusting branch chains. The displacement adjusting device of the invention can be applied to adjust an optical element which is sensitive in all six degrees of freedom so as to effectively increase the displacement adjustment accuracy of the optical element.

Description

technical field [0001] The invention belongs to the technical field of lithography projection objective lens, and in particular relates to a six-degree-of-freedom micro-displacement adjustment device for an optical element, a projection objective lens and a lithography machine. Background technique [0002] The lithography projection objective lens is one of the core components of the lithography machine, which is used in the manufacturing process of very large scale integrated circuits. At present, with the reduction of the characteristic line width of the integrated circuit, the projection objective lens is required to have a higher numerical aperture and a smaller system wave aberration. The adjustment device used for index compensation such as magnification, field curvature, astigmatism, and spherical aberration is the main tool for optical system performance compensation. The adjustment accuracy of the adjustment mechanism is often less than 100nm, and the RMS of the s...

AI Technical Summary

Problems solved by technology

For projection objectives with a node of 38nm or smaller, the positioning tolerances of optical elements are more stringent, and some elements are sensitive to multiple degrees of freedom, so a multi-degree-of-freedom adjustment mechanism is required, and the optical element adjustment device in the prior art has manufacturing Problems of high cost, large nonlinear error, and difficult processing

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