Low-density microcellular polyurethane wear-resisting sole material
A shoe sole material, polyurethane technology, applied in the field of shoe sole materials, can solve problems such as hardness and density reduction, achieve the effect of density reduction, improvement of density reduction, and light weight
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0023] A low-density microporous polyurethane wear-resistant shoe sole material, comprising:
[0025] Glycol chain extender 5
[0026] Silicone surfactant 0.5
[0027] Tertiary amine catalyst 0.3
[0028] Organometallic catalyst 0.1
[0029] Graphene fibers 5.
[0030] Tungsten carbide-cobalt cemented carbide particles 2
Embodiment 2
[0032] A low-density microporous polyurethane wear-resistant shoe sole material, comprising:
[0034] Glycol chain extender 20
[0035] Silicone Surfactant 1.2
[0036] Tertiary amine catalyst 1.0
[0037] Organometallic catalyst 0.5
[0039] Tungsten carbide-cobalt cemented carbide particles 5.
Embodiment 3
[0041] A low-density microporous polyurethane wear-resistant shoe sole material, comprising:
[0042] Polyester polyol 100
[0043] Glycol chain extender 10
[0044] Silicone surfactant 0.8
[0045] Tertiary amine catalyst 0.5
[0046] Organometallic catalyst 0.25
[0047] Graphene fibers 5
[0048] Recycled rubber tire modified pellets 15
[0049] Tungsten carbide-cobalt cemented carbide particles 4.
[0050] Its molding density of the shoe sole that embodiment 1-3 prepares is 0.1-0.3g / cm 3 , tensile strength of 4.36MPa, tear strength over 14.29MPa, excellent wear resistance, excellent mechanical properties.
PUM
Property | Measurement | Unit |
---|---|---|
density | aaaaa | aaaaa |
strength | aaaaa | aaaaa |
tear strength | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com