Etching paste based on nano-silver conductive film and preparation method thereof

Abstract

The invention provides etching paste based on a nano-silver conducting film. The etching paste is composed of a SiO2 substrate, an etching agent, polyvinylpyrrolidone, a water-borne dispersoid of a water absorbent and a polyalcohol solvent. The etching paste based on the nano-silver conducting film is mainly characterized in that the water-borne dispersoid of the water absorbent is added, the water absorbent is used as a carrier of water, the etching paste and nano-silver are prevented from reacting under normal temperature conditions and are subjected to a rapid reaction at high temperature, etching speed can be controlled under different high-temperature conditions, and etching conditions are controllable. Besides, paste left after the etching reaction can be quickly removed through washing, the trace of the etching reaction is light, and the nano-silver conducting film material obtained after etching is good in optical homogeneity.

Description

technical field [0001] The invention relates to an etching paste, in particular to an etching paste based on a nano-silver conductive film with controllable etching conditions and a preparation method thereof. Background technique [0002] The main conductive material currently used in the fields of touch screens and photoelectric displays is indium tin oxide. However, as the market requires more and more light and thin products, bendable, and low sheet resistance, nano-silver wires, nano-silver powders, etc. Nano-silver conductive film has gradually developed into an important material to replace indium tin oxide. Various conductive materials can be obtained by coating nano-silver wires on the surface of various substrates such as polyester films. [0003] In practical applications, various circuit patterns will be prepared on the surface of the conductive film to achieve different electrical functions. An important method for preparing conductive patterns is to etch vari...