QLED device
A device and quantum dot technology, applied in the field of QLED devices, can solve the problem that quantum dot films affect the luminous efficiency and service life of the device, and achieve the effects of improving electrical properties, improving stability, and improving luminous efficiency and service life.
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Embodiment 1
[0035] A QLED device comprising a substrate, a bottom electrode, a hole injection layer, a hole transport layer, an electron transport layer and a top electrode arranged in sequence, wherein the substrate is a glass substrate, the bottom electrode is ITO, and the thickness 120nm, the hole injection layer is PEDOT:PSS, the thickness is 20nm, the hole transport layer is TFB doped CdZnS / ZnS, and the doping concentration of CdZnS / ZnS is 5%, the hole transport layer The thickness of the electron transport layer is 45nm, the electron transport layer is OXD-7 doped with CdZnSe / ZnS, and the CdZnSe / ZnS doping concentration is 2.8%, the thickness of the electron transport layer is 50nm, the top electrode is Al, in the A layer of 1nm LiF is placed in front of the top electrode.
Embodiment 2
[0037] A QLED device comprising a substrate, a bottom electrode, a hole injection layer, a hole transport layer, an electron transport layer and a top electrode arranged in sequence, wherein the substrate is a glass substrate, the bottom electrode is ITO, and the thickness The hole injection layer is 120nm, the hole injection layer is PEDOT:PSS, the thickness is 20nm, the hole transport layer is TFB doped CdZnS / ZnS, and the doping concentration of CdZnS / ZnS is 3%, while doping 1% of HATCN, the thickness of the hole transport layer is 53nm, the electron transport layer is OXD-7 doped with CdZnSe / ZnS, and the CdZnSe / ZnS doping concentration is 2.8%, while doping 2% Liq, the electron transport The thickness of the layers was 46 nm, the top electrode was Al, and a layer of 1 nm LiF was placed in front of the top electrode.
Embodiment 3
[0039] A QLED device comprising a substrate, a bottom electrode, a hole injection layer, a hole transport layer, an electron transport layer and a top electrode arranged in sequence, wherein the substrate is a glass substrate, the bottom electrode is ITO, and the thickness 120nm, the hole injection layer is PEDOT:PSS, the thickness is 20nm, the hole transport layer is PMMA doped CdZnS / ZnS, and the doping concentration of CdZnS / ZnS is 10%, doped with 40% HATCN, the thickness of the hole transport layer is 45nm, the electron transport layer is PMMA doped with CdZnS / ZnS, and the CdZnSe / ZnS doping concentration is 10%, while doping 20% Liq, the electron transport layer The thickness is 40 nm, the top electrode is Al, and a layer of 1 nm LiF is arranged in front of the top electrode.
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