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Novel ultra-hard sunlight screen

A new type of ultra-hard technology, applied in optics, optical components, electronic timers, etc., to improve anti-reflective light, improve wear resistance, and improve anti-reflective effects

Inactive Publication Date: 2017-03-01
王卫国
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The present invention is to solve the problem that the sapphire window is visible in the sun, and realize the window can be read in the sun without reducing the surface hardness

Method used

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  • Novel ultra-hard sunlight screen
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  • Novel ultra-hard sunlight screen

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] In this embodiment, sapphire is used as the screen of the display, and the film is coated on the sapphire substrate. Table 1 is the specific parameters of the film layer

[0023]

[0024] Table I

[0025] Preparation of silicon nitride film layer: Due to its multiple valence states, it may be Si 3 N x Where x=2-5, at the same time, this material is prone to absorption, when Si 3 N 4 When the valence state appears, the absorption is minimal and the hardness of the film is strong. So we Si 3 N 4 During the preparation, a sputtering silicon target is used, the flow rate of the working gas argon is 100-200 sccm, the flow rate of the reaction gas nitrogen is 100-150 sccm, the coating temperature is room temperature, and the bias voltage applied to the substrate is -100-200V.

[0026] Preparation of silicon dioxide film layer: Sputtering silicon target is used, the flow rate of argon gas of working gas is 100-200 sccm, the flow rate of oxygen gas of reaction gas is 1...

Embodiment 2

[0031] In this embodiment, glass is used as the screen of the display, and the film is coated on the glass substrate. Table 2 is the specific parameters of the film layer

[0032]

[0033] Table II

[0034] Si 3 N 4 Preparation: Sputtering silicon targets are used, the flow rate of argon as a working gas is 100-200 sccm, the flow rate of nitrogen as a reaction gas is 100-150 sccm, the coating temperature is room temperature, and the bias voltage applied to the substrate is -100-200V.

[0035] Silicon / aluminum oxide (wherein Al 2 o 3 content accounted for 55%) film preparation: silicon target and aluminum target sputtering at the same time, the power of the two targets is 2 ~ 15kw, the flow rate of the working gas argon is 100 ~ 200sccm, the flow rate of the reaction gas oxygen is 100 ~ 150sccm, the coating temperature It is room temperature, and the bias voltage applied to the substrate is -100 to -200V. Silicon / aluminum oxide (wherein Al 2 o 3 The content of content...

Embodiment 3

[0039] In this embodiment, transparent ceramics are used as the screen of the display, and the film is coated on the transparent ceramic substrate. Table 3 is the specific parameters of the film layer

[0040]

[0041] Table three

[0042] Si 3 N 4 During the preparation, a sputtering silicon target is used, the flow rate of the working gas argon is 100-200 sccm, the flow rate of the reaction gas nitrogen is 100-150 sccm, the coating temperature is room temperature, and the bias voltage applied to the substrate is -100-200V.

[0043] Silicon / aluminum oxide (wherein Al 2 o 3 content accounted for 21%)

[0044] The silicon target and the aluminum target are sputtered at the same time, the power of the two targets is 2-15kw, the flow rate of the working gas argon is 100-200 sccm, the flow rate of the reaction gas oxygen is 100-150 sccm, the coating temperature is room temperature, and the bias voltage applied to the substrate is -100~-200V. Silicon / aluminum oxide (wherein ...

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Abstract

Provided is a novel ultra-hard sunlight screen. According to the sunlight screen, the surface of a window is covered by a film system so that the reflection of light on the surface is eliminated, the screen is clear and readable in the sunlight, and the surface hardness H greater than 9 and antifouling, oil-resistant and waterproof functions are provided; besides, silicon / aluminium oxide is employed in the anti-reflection film system so that the surface hardness of the film system is improved.

Description

technical field [0001] The invention relates to the field of window manufacturing, in particular to a novel superhard sunlight screen. Background technique [0002] The advent of Apple Watch has led a new trend of wearable devices. Wearable device screens have evolved from the most primitive LED screens to wear-resistant sapphire screens. [0003] The hardness of sapphire is unquestionable, and professional testing also shows that it is very difficult to scratch the surface of sapphire. But sapphire also has a fatal weakness, that is, the naked eye cannot see the content of the screen clearly when the sun is strong. DisplayMate has conducted a very professional test on this, placing the Ion-X tempered glass dial and the sapphire dial under the same sunlight intensity, and the result is that the sapphire dial reflects 72% more ambient light than the Ion-X glass dial, that is to say The clarity of the Ion-X tempered glass dial under strong light is much higher than that of ...

Claims

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Application Information

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IPC IPC(8): G02B1/14G02B1/113G02B1/18G09F9/00G04B39/00G04G17/00
Inventor 王卫国其他发明人请求不公开姓名
Owner 王卫国
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