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Vacuum ultraviolet light source device, light irradiation device and method for patterning self-assembled monomolecular film

A self-assembled single-molecule, vacuum ultraviolet light technology, used in light sources, electric light sources, lighting devices, etc., can solve the problems of high price and impracticality of excimer laser exposure devices, and achieve inhibition of ozone etching, inhibition of deformation, and good patterns. the effect of

Active Publication Date: 2017-03-22
USHIO DENKI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, excimer laser equipment and excimer laser exposure equipment are expensive, and from the COO (Cost Of Ownership) point of view, it is not practical to use them other than semiconductor exposure that is already in mass production
In other words, excimer laser devices are limited to use in industrial fields that match COO

Method used

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  • Vacuum ultraviolet light source device, light irradiation device and method for patterning self-assembled monomolecular film
  • Vacuum ultraviolet light source device, light irradiation device and method for patterning self-assembled monomolecular film
  • Vacuum ultraviolet light source device, light irradiation device and method for patterning self-assembled monomolecular film

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Experimental program
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Embodiment Construction

[0055] Embodiments of the present invention will be described below based on the drawings.

[0056] The present inventors conducted the following ozone concentration measurement experiment in order to investigate the amount of ozone generated when oxygen molecules in a processing atmosphere such as air absorb vacuum ultraviolet light (VUV light).

[0057] Specifically, using an excimer lamp that emits VUV light with a center wavelength of 172 nm, and a VUV flash lamp (VUV short-arc flash lamp: VUV-SFL) with a strong light intensity in the VUV region, it was investigated to irradiate air from both The amount of ozone generated when the cumulative exposure of VUV light is the same.

[0058] As an excimer light irradiation unit for irradiating excimer light, "Min-Excimer SUS713" manufactured by Ushio Electric Co., Ltd. was used. The light emitting length of the lamp was 100 mm, and the frequency of the power supply for supplying electric power to the lamp was 140 kHz. The spect...

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Abstract

An aim of the invention is to suppress the amount of ozone generation when vacuum ultraviolet light (VUV light) is irradiated in an atmosphere containing oxygen. A light irradiation device (100) irradiates a self-assembled monomolecular film (SAM film), which is formed on a work (W), with light containing VUV light through a mask (M) of a predetermined pattern in an atmosphere containing oxygen, thereby patterning the SAM film. The light containing VUV light irradiated on the SAM film is pulsed light and has a light emission duty ratio of from 0.00001 to 0.01 (inclusive).

Description

technical field [0001] The present invention relates to a vacuum ultraviolet light source device emitting light including vacuum ultraviolet light, a light irradiation device equipped with the vacuum ultraviolet light source device, and a method for patterning a self-assembled monomolecular film using the light irradiation device . Background technique [0002] In recent years, vacuum ultraviolet (Vacuum Ultra Violet: VUV) light having a wavelength of 200 nm or less has been used in various fields other than semiconductor exposure. For example, a technology has been developed to pattern a self-assembled monolayer (Self-Assembled Monolayer: SAM film) directly through a chemical reaction caused by light using VUV and a mask instead of using a photoresist-based patterning process. . [0003] For example, Non-Patent Document 1 discloses that photopatterning of a SAM film can be performed using VUV light without depending on specific functional groups. Specifically, an excimer...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J61/90B01J19/12H01L21/027
CPCH01J61/90G03F7/70016G03F7/7035G03F7/70933H01J61/368H01J61/545H01J61/86G03F7/70041H01J61/16H05B41/34B01J19/12G03F7/165G03F7/2004H01L21/027G03F7/0002G03F7/168G03F7/7015G03F7/70466H01L21/0274H01S3/225H01S3/2253H01S3/2255
Inventor 大和田树志铃木信二
Owner USHIO DENKI KK