Patterning device for self-assembled monomolecular film, light irradiation device, and method for patterning self-assembled monomolecular film
A self-assembled single-molecule, patterned technology, applied in the chemical/physical/physical-chemical process of applying energy, lighting device, photolithography process of pattern surface, etc., can solve the problem of high price and impracticality of excimer laser exposure device. and other problems, to achieve the effect of inhibiting ozone etching, inhibiting deformation, and good patterning
Active Publication Date: 2018-09-28
USHIO DENKI KK
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Problems solved by technology
However, excimer laser equipment and excimer laser exposure equipment are expensive, and from the COO (Cost Of Ownership) point of view, it is not practical to use them other than semiconductor exposure that is already in mass production
In other words, excimer laser devices are limited to use in industrial fields that match COO
Method used
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Embodiment Construction
[0055] Embodiments of the present invention will be described below based on the drawings.
[0056] The present inventors conducted the following ozone concentration measurement experiment in order to investigate the amount of ozone generated when oxygen molecules in a processing atmosphere such as air absorb vacuum ultraviolet light (VUV light).
[0057] Specifically, using an excimer lamp that emits VUV light with a center wavelength of 172 nm, and a VUV flash lamp (VUV short-arc flash lamp: VUV-SFL) with a strong light intensity in the VUV region, it was investigated to irradiate air from both The amount of ozone generated when the cumulative exposure of VUV light is the same.
[0058] As an excimer light irradiation unit for irradiating excimer light, "Min-Excimer SUS713" manufactured by Ushio Electric Co., Ltd. was used. The light emitting length of the lamp was 100 mm, and the frequency of the power supply for supplying electric power to the lamp was 140 kHz. The spect...
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The amount of ozone generated when the atmosphere containing oxygen is irradiated with vacuum ultraviolet light (VUV light) can be suppressed. A light irradiation device (100) irradiates light including VUV light to a self-assembled monomolecular film (SAM film) formed on a workpiece (W) through a mask (M) formed with a predetermined pattern in an atmosphere containing oxygen. , thereby patterning the above-mentioned SAM film. The light including VUV light irradiated to the SAM film is pulsed light, and the duty ratio of light emission is 0.00001 or more and 0.01 or less.
Description
technical field [0001] The present invention relates to a vacuum ultraviolet light source device emitting light including vacuum ultraviolet light, a light irradiation device equipped with the vacuum ultraviolet light source device, and a method for patterning a self-assembled monomolecular film using the light irradiation device . Background technique [0002] In recent years, vacuum ultraviolet (Vacuum Ultra Violet: VUV) light having a wavelength of 200 nm or less has been used in various fields other than semiconductor exposure. For example, a technology has been developed to pattern a self-assembled monolayer (Self-Assembled Monolayer: SAM film) directly through a chemical reaction caused by light using VUV and a mask instead of using a photoresist-based patterning process. . [0003] For example, Non-Patent Document 1 discloses that photopatterning of a SAM film can be performed using VUV light without depending on specific functional groups. Specifically, an excimer...
Claims
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IPC IPC(8): H01J61/90B01J19/12H01L21/027
CPCH01J61/90G03F7/70016G03F7/7035G03F7/70933H01J61/368H01J61/545H01J61/86G03F7/70041H01J61/16H05B41/34B01J19/12G03F7/165G03F7/2004H01L21/027G03F7/0002G03F7/168G03F7/7015G03F7/70466H01L21/0274H01S3/225H01S3/2253H01S3/2255
Inventor 大和田树志铃木信二
Owner USHIO DENKI KK