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A process for purifying boron trifluoride gas by low-temperature rectification

A boron trifluoride, low temperature rectification technology, applied in the direction of boron halide compound, boron halide, etc., can solve the problem of unstable product quality, and achieve the effect of simple and stable temperature control, low equipment investment and good effect

Active Publication Date: 2020-01-14
中昊光明化工研究设计院有限公司 +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] There is no regular manufacturer of high-purity boron trifluoride in China. Only Zhonghao Guangming Chemical Research and Design Institute Co., Ltd. adopts the high-purity boron trifluoride production line produced by high-temperature pyrolysis of sodium fluoroborate. The output is only in kilograms. Other manufacturers The product quality is about 99.5%, and the product quality is not stable

Method used

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  • A process for purifying boron trifluoride gas by low-temperature rectification

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example 1

[0028] The boron trifluoride raw material gas is compressed first, and the raw material gas composition is: SO 2 6000ppm, SO 3 50ppm, HF100ppm, SiF 4 15ppm, air (N 2 +O 2 ) 1.2%, BF 3 98.18%. Compress the gas to 3.5MPa, enter the liquefaction tank for liquefaction, and then enter the rectification tower. The temperature of the refrigerant in the top condenser is -38°C to -40°C, the temperature of the material in the tower kettle is 12°C-15°C, and the pressure of the rectification tower is controlled At 3.35-3.4MPa. The feed rate is 110-120KG / h. The continuous rectification has a stable discharge rate of 100-110KG / h, and the product analysis result is obtained: SO 2 12ppm, SO 3 5ppm, HF 3ppm, SiF 4 14ppm, air (N 2 +O 2 ) 251ppm, BF 3 99.97%.

example 2

[0030] The boron trifluoride raw material gas is compressed first, and the raw material gas composition is: SO 2 8500ppm, SO 3 70ppm, HF110ppm, SiF 4 16ppm, air (N 2 +O 2 ) 1.1%, BF 3 98.03%. Compress the gas to 3.3MPa, enter the liquefaction tank for liquefaction, and then enter the rectification tower. The temperature of the refrigerant in the top condenser is -40°C to -42°C, the temperature of the material in the tower kettle is 12°C-15°C, and the pressure of the rectification tower is controlled At 3.2-3.25MPa. The feed rate is 100-110KG / h. The continuous rectification has a stable discharge rate of 90-100KG / h, and the product analysis result is obtained: SO 2 15ppm, SO 3 6ppm, HF 3ppm, SiF 4 14ppm, air (N 2 +O 2 ) 211ppm, BF 3 99.98%.

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Abstract

The invention discloses a process for purifying boron trifluoride gas through rectification at the low temperature and belongs to the technical field of high-purity boron trifluoride production. According to the process, boron trifluoride gas containing impurities is treated through steps including compression, liquification, low-temperature rectification, filling and the like, and high-purity boron trifluoride gas with the purity of 99.9%-99.99% is finally obtained. Gas is compressed to 2.0-4.0 MPa and liquified at the temperature of subzero 50 DEG C to subzero 30 DEG C to form a liquid, and the liquid enters a rectification tower for rectification. The operation conditions of the rectification tower are shown as follows: the temperature of the top of the tower ranges from subzero 40 DEG C to subzero 30 DEG C, the temperature of the bottom of the tower ranges from 10 DEG C to 15 DEG C, the pressure ranges from 3.0 MPa to 4.0 MPa, and rectification is operated continuously. The process is simple and easy to implement, high requirements of ultralow temperature rectification for equipment are avoided, the equipment investment is low, the yield is high, and the product purity is high. The process is suitable for industrial continuous production.

Description

technical field [0001] The invention relates to a process for purifying boron trifluoride gas by low-temperature rectification, which belongs to the technical field of high-purity boron trifluoride production. Background technique [0002] As a special boron reagent and fluoride, boron trifluoride is widely used in organic synthesis catalysts, elemental boron manufacturing, boron fiber processing, preparation of organic boron compounds, and high-purity boron trifluoride can also be used in the electronics industry. P-type dopant source for silicon and germanium epitaxy, diffusion and ion implantation processes. [0003] For the production of boron trifluoride, developed countries such as the United States, Germany, Japan, and India have large-scale production plants, among which the bottled boron trifluoride gas produced by United Signal Corporation in the United States and BASF in Germany occupies a major share in the world . The boron trifluoride produced by Nippon Iron ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B35/06
CPCC01B35/061C01P2006/80
Inventor 范正林任少科董涛姜涛石金英孙玮
Owner 中昊光明化工研究设计院有限公司
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