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Photosensitive polymer material

A technology of photosensitive polymer and parts by weight, applied in the field of functional materials, can solve the problems of poor stability, reduced photosensitive effect, single variety of photosensitive materials, etc., and achieves the effects of excellent stability and simple production process.

Inactive Publication Date: 2017-05-31
吴中区穹窿山师匠新材料技术咨询服务部
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Photosensitive polymer materials have the characteristics of high sensitivity, high resolution, high diffraction efficiency, and simple processing. They are ideal polymer materials. However, the existing photosensitive materials are relatively single in variety and poor in stability. After the rate is increased, the photosensitive effect will be significantly reduced, and the performance in heat resistance, weather resistance, water resistance and other aspects is relatively poor.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0012] Embodiment 1: Preparation of photosensitive polymer material.

[0013] The photosensitive polymer material of the present embodiment comprises the following components: polyvinyl alcohol cinnamate resin (cinnamic acid molar content 25%) 100kg, 2,4,6-trinitroaniline 4kg, ferrocene hexafluorophosphate 2kg, 1,4-naphthoquinone 0.1kg and simethicone 1kg.

Embodiment 2

[0014] Embodiment 2: Preparation of photosensitive polymer material.

[0015] The photosensitive polymer material of the present embodiment comprises the following components: polyvinyl alcohol cinnamate resin (cinnamic acid molar content 30%) 100kg, 2,4,6-trinitroaniline 6kg, ferrocene hexafluorophosphate 5kg, 1,4-naphthoquinone 0.5kg and simethicone 5kg.

Embodiment 3

[0016] Embodiment 3: Preparation of photosensitive polymer material.

[0017] The photosensitive polymer material of the present embodiment comprises the following components: polyvinyl alcohol cinnamate resin (cinnamic acid molar content 35%) 100kg, 2,4,6-trinitroaniline 5.5kg, ferrocene hexafluorophosphate 4kg , 0.2kg of 1,4-naphthoquinone and 2kg of simethicone.

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Abstract

The invention relates to a photosensitive polymer material. Particularly, the photosensitive polymer material is prepared from, by weight, 100 parts of polyvinyl cinnamate resin, 4-6 parts of 2,4,6-trinitrobenzene, 2-5 parts of ferrofluorophosphate, 0.1-0.5 part of 1,4-naphthoquinone and 1-5 parts of dimethicone. The photosensitive polymer material is excellent in stable performance, can sense light for a long time, the initial light sensing effect of the photosensitive polymer material is kept, the heat resistance, weather resistance and other performances are remarkably improved, the production technology is simple and easy to implement, and the photosensitive polymer material is suitable for industrial large-scale production.

Description

technical field [0001] The invention belongs to the field of functional materials and relates to a photosensitive polymer material. Background technique [0002] Photosensitive material is a semiconductor material with photosensitive properties, so it is also called photoconductive material or photosensitive semiconductor. At present, photosensitive materials are often used in optical instruments such as copiers and cameras. Photosensitive materials are generally divided into two categories: black and white photosensitive materials and color photosensitive materials. [0003] Photosensitive polymer material has the characteristics of high sensitivity, high resolution, high diffraction efficiency, and simple processing. It is an ideal polymer material. However, the existing photosensitive materials are relatively single in variety and poor in stability. After the rate is high, its photosensitive effect will be significantly reduced, and its performance in heat resistance, w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L29/04C08L83/04C08K5/18C08K5/08C08K5/00
CPCC08L29/04C08L2201/08C08L83/04C08K5/18C08K5/08C08K5/00
Inventor 查林珍
Owner 吴中区穹窿山师匠新材料技术咨询服务部
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