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Photoresistor ceramics and preparation method

A technology of photosensitive resistors and ceramics, which is applied in the manufacture of circuits, electrical components, and final products, and can solve problems such as poor stability and reduced performance parameters of photosensitive resistor ceramics

Inactive Publication Date: 2017-06-09
ANHUI TUOJITAI NOVEL CERAMIC TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention provides a photosensitive resistor porcelain and its preparation method, which solves the problems of reduced performance parameters and poor stability of the existing photosensitive resistor porcelain after the aging process

Method used

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  • Photoresistor ceramics and preparation method

Examples

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Embodiment 1

[0019] This embodiment provides a kind of photoresistor porcelain, which is made of the following components by weight: 60 parts of CdS, 30 parts of CdSe, CdCl 2 2.8 parts, ZnCl 2 3.5 parts, CuCl 2 3.5 parts, LiCl 2 2 parts of Cu(NO 3 ) 2 1 part of solution.

[0020] The preparation method of the photoresistor ceramic of the present embodiment comprises the following steps:

[0021] (1) Take CdSe and burn it at 450°C for 6 hours in a nitrogen atmosphere, then grind it with deionized water, and dry it for later use;

[0022] (2) Take CdS, CdCl 2 , ZnCl 2 , CuCl 2 , LiCl 2 Dry the standby CdSe in step (1), add deionized and grind to mix evenly, then add Cu(NO 3 ) 2 Grind evenly;

[0023] (3) Spray the above mixed solution on the substrate with a spray gun, spray the film, dry, put it into a tube furnace for firing, and obtain it. The firing is carried out at 600° C. for 40 minutes in a nitrogen atmosphere. The step (3) further includes the step of spraying an e...

Embodiment 2

[0025] This embodiment provides a kind of photoresistor porcelain, which is made of the following components by weight: 50 parts of CdS, 35 parts of CdSe, CdCl 2 2 parts, ZnCl 2 4 parts, CuCl 2 3 parts, LiCl 2 3.5 parts of Cu(NO 3 ) 2 0.5 parts by weight of the solution.

[0026] The preparation method of the photoresistor ceramic of the present embodiment comprises the following steps:

[0027] (1) Take CdSe and burn it at 400°C for 7 hours in a nitrogen atmosphere, then grind it with deionized water, and dry it for later use;

[0028] (2) Take CdS, CdCl 2 , ZnCl 2 , CuCl 2 , LiCl 2 Dry the standby CdSe in step (1), add deionized and grind to mix evenly, then add Cu(NO 3 ) 2 Grind evenly;

[0029] (3) Spray the above mixed solution on the substrate with a spray gun, spray the film, dry, put it into a tube furnace for firing, and obtain it. The firing is carried out at 600° C. for 30 minutes in a nitrogen atmosphere. The step (3) further includes the step of ...

Embodiment 3

[0031] This embodiment provides a kind of photoresistor porcelain, which is made of the following components by weight: 70 parts of CdS, 20 parts of CdSe, CdCl 2 3.5 parts, ZnCl 2 2.5 parts, CuCl 2 4 parts, LiCl 2 1 part, Cu(NO 3 ) 2 1.5 parts by weight of the solution.

[0032] The preparation method of the photoresistor ceramic of the present embodiment comprises the following steps:

[0033] (1) Take CdSe and burn it at 500°C for 5 hours in a nitrogen atmosphere, then grind it with deionized water, and dry it for later use;

[0034] (2) Take CdS, CdCl 2 , ZnCl 2 , CuCl 2 , LiCl 2 Dry the standby CdSe in step (1), add deionized and grind to mix evenly, then add Cu(NO 3 ) 2 Grind evenly;

[0035] (3) Spray the above mixed solution on the substrate with a spray gun, spray the film, dry, put it into a tube furnace for firing, and obtain it. The firing is carried out at 600° C. for 45 minutes in a nitrogen atmosphere. The step (3) further includes the step of spr...

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Abstract

The invention discloses photoresistor ceramics, and belongs to the functional ceramics technology field. The photoresistor ceramics are prepared by following components, by weight, 50-70parts of CdS, 20-35 parts of CdSe, 2-3.5 parts of CdC12, 2.5-4 parts of ZnC12, 3-4parts of CuC12, 1-3.5parts of LiC, and 0.5-1.5 parts of Cu(NO3)2 solution containing 1mg / ml Cu. The preparation method of the photoresistor ceramics provided by the invention comprises steps that the CdSe is fired for 5-7hours, is porphyrized, and then is dried; the various components and the above mentioned CdSe are porphyrized and mixed uniformly, and then the Cu(NO3)2 is added in the above mentioned mixture, and then is porphyrized uniformly; the above mentioned mixed solution is sprayed on a base body for film spraying by a spray gun, and is dried, and then is put in a tubular furnace for firing, and then the photoresistor is acquired. The performance parameters of the prepared photoresistor are reduced after aging technology, and the stability of the prepared photoresistor is good, the photosensitivity of the prepared photoresistor is improved by 50%, and the rejection rate of the prepared photoresistor is controlled to be within 5%.

Description

technical field [0001] The invention relates to the technical field of functional ceramics, in particular to a photosensitive resistor porcelain and a preparation method thereof. Background technique [0002] The spectral characteristics of photoresistors refer to the wavelength of light at which the photoresistor has the highest sensitivity. For example, the peak sensitivity wavelength of CdS is 520nm, and the peak sensitivity wavelength of CdSe is 720nm. change continuously. Photoelectric sensitivity refers to the size of the photocurrent generated under certain lighting conditions, which is related to the number of photogenerated carriers in the material, the lifetime, and the distance between the electrodes. But in different occasions other representations are different. [0003] The photosensitive layer of the photoresistor is formed by coating the photosensitive solution on the surface of the ceramic substrate and sintering at high temperature. The photosensitive la...

Claims

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Application Information

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IPC IPC(8): H01L31/0296H01L31/18
CPCH01L31/02963H01L31/1828Y02P70/50
Inventor 何东张天宇宋晓超张天舒
Owner ANHUI TUOJITAI NOVEL CERAMIC TECH
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