Vertical multi-station quartz tube cleaning machine and cleaning method

Abstract

The invention discloses a vertical multi-station quartz tube cleaning machine. The vertical multi-station quartz tube cleaning machine comprises a cleaning platform rotationally arranged in a body, one or more outer spray pipes and a plurality of inner spray pipes, wherein multiple mounting holes penetrate through the surface of the cleaning platform and surround the center of the surface of the cleaning platform, rotating discs are arranged on the inner sides of the mounting holes, and quartz tubes are fixed on the rotating discs, driven by the rotating discs to conduct autorotation and driven by the cleaning platform to conduct revolution; the outer spray pipes are vertically arranged in the body and located on the outer sides of the quartz tubes, a plurality of spray nozzles are arranged along the side walls of the outer spray pipes and used for spraying a cleaning liquid or gas to clean or dry the outer walls of the quartz tubes; the plurality of inner spray pipes are in one-to-one correspondence to the rotating discs and penetrate into the quartz tubes from the lower sides of the rotating discs, a plurality of spray nozzles are also arranged on the side walls and the tops of the inner spray pipes and used for spraying a cleaning liquid or gas to clean or dry the inner walls of the quartz tubes. The invention further discloses a corresponding cleaning method. Multiple quartz tubes can be comprehensively and effectively cleaned once, waste liquids obtained after cleaning can be recovered in a classified manner, and the vertical multi-station quartz tube cleaning machine is simple in structure and easy to implement.

Description

technical field [0001] The invention relates to the technical field of semiconductor cleaning equipment, and more specifically, to a vertical multi-station quartz tube cleaning machine and a cleaning method for cleaning quartz tubes using the cleaning machine. Background technique [0002] The quartz tube is used in conjunction with the diffusion furnace, which is often used for high-temperature diffusion of silicon wafers in semiconductor processing. [0003] When carrying out the high temperature diffusion process, the silicon wafer and the silicon wafer bracket are put into the quartz tube for the process. In order to make the diffusion more stable and the distribution of the PN junction more uniform, it is necessary to ensure that the pressure in the quartz tube is stable and the airtightness is good. [0004] Usually, negative pressure technology is used to detect the airtightness of the quartz tube, and only when the airtightness meets the requirements can the process...

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Problems solved by technology

[0006] Chinese invention patent application CN101181711 discloses an automatic vertical quartz tube cleaning machine and its cleaning process. The quartz tube can complete each process in the cleaning process in a cabinet, but its cleaning capacity is not high, and only one quartz tube can be cleaned at a time. Tube

[0007] Chinese utility model patent CN205289141U discloses a quartz tube coaxial drive horizontal cleaning machine. The workpiece is cleaned in the cleaning tank. Although the process tank will be cleaned after each cleaning, it will inevitably cause crossover during the cleaning process. Pollution, and not only a waste of water, but also poor cleaning ability

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