Composite nanoimprint lithography machine and working method thereof

Abstract

The invention discloses a composite nanoimprint lithography machine and a working method thereof. By the composite nanoimprint lithography machine, the problems of relatively large deformation, low imprint accuracy and poor imprint quality of an imprint pattern are solved. By closely matching of a roller, a composite soft die and a workbench, large-area imprint and opened demoulding are high-efficiency and automatically completed under joint and synergistic effects of positive pressure and negative pressure, and large-area micronano patterning of an over-sized rigid substrate is achieved. In the technical scheme, the composite nanoimprint lithography machine comprises a base, wherein the workbench is fixed on the base, a vacuum suction disc is arranged on a mobile table surface of the workbench and is attached onto a substrate in a vacuum way, an imprint material is uniformly coated on the substrate, an imprint module is correspondingly arranged on the substrate in a matching way and comprises an imprint assembly and a curing assembly, the imprint assembly comprises the roller, the composite soft die is attached onto an outer surface of the roller in a vacuum way, an elastic material layer wraps the outer surface of the roller, the composite soft die is provided with a flexible material layer, and the flexible material layer is in contact with the roller and is arranged at one side.

Description

technical field [0001] The invention belongs to the technical field of micro-nano manufacturing, and relates to a composite nano-imprint photolithography machine, in particular to a large-area composite nano-imprint photolithography machine and a working method based on roller assistance and a composite soft mold. Background technique [0002] In order to improve and improve the performance and quality of products in the fields of high-definition flat panel display, high-efficiency solar panels, anti-reflection and self-cleaning glass, LED patterning, and wafer-level micro-nano optical devices, there is a huge need for large-area micro-nano patterning technology. industry needs. The common feature of these products is that large-area complex three-dimensional micro-nano structures need to be manufactured efficiently and at low cost on large-scale non-flat rigid substrates (hard substrates or substrates). However, various existing micro-nano manufacturing technologies (such ...

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Problems solved by technology

The problems of this method are: on the one hand, the film soft mold will be deformed under the imprinting force during the imprinting process, and direct curing will cause large deformation of the embossed pattern after curing, resulting in low imprinting accuracy and poor imprinting quality. Poor; on the other hand, imprinting and curing are carried out at the same time, requiring imprinting materials to have fast curing performance (which limits the choice of imprinting materials), and at the same time, there is a problem of incomplete curing (even at a very low pressure (2) The embossing force is directly applied to the roller (or the roller shaft). On the one hand, it is difficult to ensure uniform imprinting force, resulting in poor consistency of embossed graphics, and the embossed area is affected. On the other hand, it has poor adaptability to the unevenness of the substrate, especially it is difficult to imprint super-large substrates and fragile substrates; (3) the rotation of the roller drives the connected trachea to rotate, resulting in entanglement of the trachea, The normal and reliable working cycle cannot be realized, especially when the imprinting efficiency is high (the roller rotates very fast), which will cause the equipment to fail to work; (4) The long grooves se

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