Manufacturing method of display substrate, display substrate and display device
A display substrate and manufacturing method technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of reducing liquid repellency, increasing the risk of ink overflow, and pollution of the pixel boundary layer, so as to reduce overflow The effect of the risk of flow
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[0052] The specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are only used to illustrate and explain the present invention, and not to limit the present invention.
[0053] reference figure 1 , Figure 2a to Figure 2f as well as image 3 . The first aspect of the present invention relates to a manufacturing method S100 of the display substrate 100. Wherein, the method S100 includes:
[0054] S110: Provide a base substrate 110.
[0055] Specifically, such as Figure 2a As shown, the base substrate 110 may be a transparent glass substrate. When the base substrate 110 forms the first pixel defining layer 120 described below, an anode layer 170 has been formed. The material of the anode layer 170 can usually be selectively oxidized. High-performance transparent or semi-transparent conductive materials such as indium tin (ITO), silver (Ag), n...
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