Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for increasing paddy stigma exsertion rate

A technology of exposed stigmas and paddy rice, applied in chemical instruments and methods, botany equipment and methods, biochemical equipment and methods, etc., can solve the problems of low stigma exposed rate and difficulty in seed production, and achieve the effect of saving manpower and material resources

Inactive Publication Date: 2017-09-26
HUAZHONG AGRI UNIV
View PDF0 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There is evidence that some excellent sterile lines in production are difficult to produce seeds because of the low rate of exposed stigma

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for increasing paddy stigma exsertion rate
  • Method for increasing paddy stigma exsertion rate
  • Method for increasing paddy stigma exsertion rate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] Example 1: Localization of the main genes GS3 and GW5 for the exposed rate of the stigma

[0053] 1. Whole-genome sequencing of 533 core germplasm materials

[0054] In this example, 533 diverse cultivated rice materials from all over the world including local varieties and excellent germplasm resources were collected, including 200 Chinese micro-core germplasm resources, 132 parent lines of the international rice molecular breeding program, and 148 from The USDA Rice Gene Bank varieties, 18 varieties used to develop SNPs in the Rice Seed SNP Program and 35 germplasms from the worldwide collection provided by the International Rice Research Institute. All genomic DNA was extracted from leaf tissue of plants using the conventional CTAB method (Murray & Thompson 1980 Nucleic Acid Res 8:4321-4325). The construction of the paired-end sequencing library with a size of 450-500bp refers to the Illuminate standard procedure. The Illuminate HiSeq 2000 sequencing platform gener...

Embodiment 2

[0075] Example 2: Functional verification and effect analysis of GS3 and GW5

[0076] 1. Functional verification of GS3 and GW5

[0077] Most of this work is based on previous work. In order to verify the effects of the three grain type genes on the exposed rate of the stigma, the applicant used three groups of transgenic materials. GW5 OX(+) and GW5 OX(-) were provided by Wan Jianmin, Institute of Crop Science, Chinese Academy of Agricultural Sciences (Wan et al.2008); GW2(cDNA) and control were provided by Lin Hongxuan, Shanghai Institute of Plant Physiology and Ecology, Chinese Academy of Sciences Provided by the teacher (Song et al.2007); GS3 OX(+) and GS3 OX(-) were derived from the previous research of the State Key Laboratory of Crop Genetic Improvement, Huazhong Agricultural University (Mao et al.2010). The construction of plasmids and overexpression vectors used in transgenes is as follows: Figure 4 shown. All transgenic materials were planted in random blocks in...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of rice molecular breeding. In particular, it relates to a method for increasing the rice stigma exposure rate. The present invention utilizes the GS3 gene dCAPS marker SF28 and the GW5 gene STS marker Indel1 or Indel2 or N1212 to conduct association analysis on 533 cultivated rice genomes, locate 3 QTLs affecting stigma exposure, and confirm that GS3 and GW5 genes are the ones that affect rice The main genes of stigma exposure, GS3 and GW5 genes are in linkage disequilibrium, which affect the rate of stigma exposure in rice by regulating seed size and stigma length.

Description

technical field [0001] The invention belongs to the technical field of rice molecular breeding. In particular, it relates to a method for increasing the rice stigma exposure rate. The present invention utilizes the GS3 gene dCAPS marker SF28 and the GW5 gene STS marker Indel1 or Indel2 or N1212 to conduct genome-wide association analysis on 533 cultivated rice, locate 3 QTLs affecting stigma exposure, and confirm that GS3 and GW5 genes are the ones that affect rice The main genes of stigma exposure, GS3 and GW5 genes are in linkage disequilibrium, which affect the rate of stigma exposure in rice by regulating seed size and stigma length. Background technique [0002] Rice is the main food crop in my country, and the self-fertilization mechanism of rice leads to low efficiency of hybrid rice seed production. Hybrid rice seed production in production is a field production process in which cross-pollination is achieved through artificial planting of male sterile lines (female...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C07K14/415C12Q1/68C12N15/11A01H1/02A01H1/04
CPCC07K14/415A01H1/02A01H1/04C12Q1/6895C12Q2600/13C12Q2600/156
Inventor 何予卿周浩张庆路高冠军
Owner HUAZHONG AGRI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com