Cleaning method for monocrystal pulling device, cleaning tool used for same, and production method for monocrystal
一种提拉装置、单晶的技术,应用在清洁方法和用具、利用气体流动的清洁方法、自熔融液提拉法等方向,能够解决单晶提拉装置结构复杂、难以完全扫除单晶提拉装置各个角落、无法降低单晶位错化的发生率等问题,达到降低位错化的发生率、减少异物的脱离的效果
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[0051] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.
[0052] figure 1 It is a schematic cross-sectional view showing the structure of the single crystal pulling device 1 to be cleaned according to the present invention.
[0053] like figure 1 As shown, the single crystal pulling device 1 is a device for manufacturing silicon single crystals for semiconductors by the CZ method, and includes a chamber 10, a heat insulating material 11 disposed inside the chamber 10, and a support housed in the chamber 10. The base 13 of the quartz crucible 12, the rotation support shaft 14 supporting the base 13 in a liftable manner, the heater 15 arranged to surround the base 13, the heat shield 16 arranged above the base 13, and The single crystal pulling wire 17 arranged above the susceptor 13 and coaxially with the rotation support shaft 14 and the wire rope take-up mechanism 18 arranged above the chamber 10 .
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