Unlock instant, AI-driven research and patent intelligence for your innovation.

Novel photo curing composition and application thereof

A photocuring and composition technology, applied in optics, photomechanical equipment, photosensitive materials used in photomechanical equipment, etc., can solve the problems of high price, poor absorption capacity of LED light source, inability to cure or incomplete curing, etc.

Active Publication Date: 2017-10-27
CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS +1
View PDF9 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, most of the existing light-curing systems have poor absorption capacity for LED light sources, and often cannot be cured or are incompletely cured. A few applicable systems have more restrictions on the types of components, and are expensive, and most of them are foreign patented technologies product

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel photo curing composition and application thereof
  • Novel photo curing composition and application thereof
  • Novel photo curing composition and application thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0093]

[0094] The photocurable composition of the present invention can be obtained by weighing each component according to the amount and mixing them uniformly.

[0095] At present, commercially available products in the field of light curing, especially mid-to-high-end products, are mainly imported. Most of these products have patented technology and high product prices. However, domestic companies lack core technologies and independent intellectual property rights. Under strict technical barriers, enterprise development is difficult. Even the R&D layout has been greatly restricted. Through component optimization, the photocurable composition obtained in the present invention has a large photosensitive wavelength range and good photocurable effect, and is applied in many aspects such as paints, coatings, inks, molding materials, etc., and has strong technical and market competitiveness.

specific Embodiment approach

[0096] The present invention will be described in further detail below in conjunction with specific examples, but they should not be construed as limiting the protection scope of the present invention.

[0097] Unless otherwise specified, the parts described below are all parts by weight. The meaning of each abbreviation is as follows:

[0098] A1:

[0099] A2:

[0100] A3:

[0101] A4:

[0102] B1: diethylene glycol dimethacrylate;

[0103] B2: bisphenol A epoxy acrylate resin (SM6105-80);

[0104] B3: dodecyl vinyl ether;

[0105] B4: ethylene glycol and glycidyl ether;

[0106] B5:

[0107] C1:

[0108] C2:

[0109] C3:

[0110] C4:

[0111] 1. Preparation of photocurable composition

[0112] The photocurable composition was prepared according to the formula shown in Table 1 below.

[0113] Table 1

[0114]

[0115]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a novel photo curing composition. The novel photo curing composition comprises an anthracene ester sensitizer which is selected from a compound with the structure as shown in the formula (1) and / or a macromolecular compound taking the compound as shown in the formula (1) as the main structure, a reaction type compound which comprises at least one kind of an unsaturated double bond-containing compound and / or an epoxy group-containing compound, and a photoinitiator. Through component selection and optimization, the composition can be suitable for the free radical type, positive ion type and hybrid type photo curing systems, and has extremely high response to the light source within the wavelength range of 200-500nm, high curing speed, excellent developing and picture completeness, high curing film hardness, and strong adhesive force on a substrate.

Description

technical field [0001] The invention belongs to the field of organic photocuring, and in particular relates to a novel photocuring composition and its application in the field of photocuring. Background technique [0002] UV curing technology has a very wide range of applications in the preparation of electronic materials and other fields. According to the different mechanism of initiating polymerization, it can be divided into two categories: free radical type and cationic type. The application of both has its own emphasis. At present, high-pressure mercury lamps (usually in the wavelength range of 200-360nm) are the main light sources for photocuring systems. However, high-pressure mercury lamps consume more energy and pollute the environment, and their use is increasingly restricted. LED light sources (usually in the wavelength range of 320-500nm) have low damage, high energy and low consumption, and are considered to be able to replace mercury lamps as a good substitute ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F7/031G03F7/004
CPCG03F7/004G03F7/031
Inventor 钱晓春胡春青
Owner CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS