Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A Support Vector Machine Recognition Optimization Method Based on Multi-resolution Analysis

A technology of multi-resolution analysis and support vector machine, which is applied to pattern recognition in signals, character and pattern recognition, computer components, etc., and can solve the problem of large number of sample points and large computing resource overhead for support vector machine learning. Problems with high computational complexity achieve the effect of reducing the number of sample points, improving accuracy, and smoothing signals

Active Publication Date: 2021-01-26
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the radio frequency fingerprint feature extraction technology, although the use of support vector machines can improve the accuracy of radio frequency fingerprint recognition, but the demand for the number of sample points for support vector machine learning is very large, resulting in high computational complexity and high computational resource overhead.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Support Vector Machine Recognition Optimization Method Based on Multi-resolution Analysis
  • A Support Vector Machine Recognition Optimization Method Based on Multi-resolution Analysis
  • A Support Vector Machine Recognition Optimization Method Based on Multi-resolution Analysis

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] Such as figure 1 As shown, a support vector machine recognition optimization method based on multi-resolution analysis, including:

[0042] The method includes a step S6 of performing multi-resolution analysis on the waveform in radio frequency fingerprint identification technology;

[0043] In the step S6, a multi-resolution analysis is performed on the coherent accumulation denoising signal obtained in the step A.

[0044] Further, the multi-resolution analysis adopts three levels of multi-resolution analysis, with the dB2 waveform function as the mother wavelet, and three discrete wavelet transforms are performed successively on the signal waveform:

[0045] f a1i =DWT(f avi ,dB2)

[0046] f a2i =DWT(f a1i ,dB2)

[0047] f a3i =DWT(f a2i ,dB2).

[0048] Further, the method includes detection step S1, sample point collection step S2, numbering step S3, coherent accumulation denoising step S4, amplitude flipping step S5 and waveform normalization processing S...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a support vector machine recognition and optimization method based on multi-resolution analysis. It includes a step S6 of performing multi-resolution analysis on the waveform in the radio frequency fingerprint identification technology. The step S6 is to perform multi-resolution analysis on the coherent accumulation denoising signal obtained in step A. The present invention can improve the accuracy of radio frequency fingerprint identification by using support vector machine, reduce the computational complexity of support vector machine learning with a large number of sample signals, adopt the method of multi-resolution analysis to extract the feature points in signal samples, and ensure the accuracy of radio frequency fingerprint On the premise of features, the number of sample points for support vector machine learning is reduced, thereby reducing the computational complexity.

Description

technical field [0001] The invention relates to the field of physical layer access authentication of wireless equipment, in particular to a support vector machine identification and optimization method based on multi-resolution analysis. Background technique [0002] Feature extraction comes from image processing. In signal detection and processing, it is a method of analyzing and transforming the preprocessed signal to highlight the representative (with obvious physical or statistical significance) features of the signal and Extract saved method. The purpose of feature extraction is to reduce data storage and reduce input data redundancy, so as to facilitate the discovery of more meaningful latent variables, and help in-depth understanding and analysis of a large number of similar signals. RF fingerprint feature extraction is a key step in RF fingerprint identification. For the received wireless signal, the receiver must preprocess the signal, such as some necessary detect...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G06K9/62G06K9/00
CPCG06F2218/04G06F2218/08G06F2218/12G06F18/2411
Inventor 谢非佚文红
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products