Solar cells with transparent electrode films embedded in arrays of two-dimensional conductive materials

Abstract

The present invention provides a crystalline silicon heterojunction solar cell of embedded transparent electrode film with a two-dimensional conductive material array. The embedded transparent electrode film with two-dimensional conductive material array is formed by a first layer of a patterning two-dimensional conductive material array arranged on a p type and / or n type doped si-based film and a second layer of transparent protective film covered on a patterning two-dimensional conductive material array. The transparent electrode light transmittence approaches to that of a traditional indium-based oxide transparent conductive film, and the resistivity is lower than that of the traditional indium-based oxide transparent conductive film. The transparent electrode film can greatly match a Smart Wire interconnection technology so as to reduce the dosage of precious metals Ag and effectively reduce the cost of the crystalline silicon heterojunction solar cell.

Description

technical field [0001] The invention belongs to the technical field of solar photovoltaics, in particular to a heterogeneous crystal silicon solar cell with a two-dimensional conductive material array embedded transparent electrode film. Background technique [0002] HIT (Hetero-junction with Intrinsic Thin-layer) cell is a high-efficiency heterojunction silicon-based solar cell first introduced by Sanyo Corporation of Japan. The main feature of the cell is the high-quality passivation of the surface of a single crystal silicon wafer by using an intrinsic silicon-based thin film. At the same time, doped and intrinsic silicon-based thin films form heterojunctions with single crystal silicon to obtain open circuit voltages as high as 750mV, 39.5mA / cm 2 Short-circuit current and photoelectric conversion efficiency above 24% (Proceedings of the 28th EUPVSEC, 2013, 748-751). The fabrication process is roughly as follows: Intrinsic and p-type silicon-based thin film layers are s...

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Problems solved by technology

However, the realization of this battery structure requires dry and wet etching of the TCO film, and the dry etching equipment and process are relatively expensive and complicated, and the control accuracy of the wet etching process is difficult to guarantee.

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