Silicon block cleaning and drying device

A technology of drying device and silicon block, which is applied in the directions of cleaning flexible items, cleaning methods and utensils, cleaning methods using liquids, etc., which can solve customer product quality doubts, unqualified downstream product quality, and inability to completely remove metal impurities silicon powder and scratches

Active Publication Date: 2017-11-21
新疆新特新能材料检测中心有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, since polysilicon is a high-purity product, during the crushing process, metal impurities will adhere to the surface of the silicon block due to contact with equipment, air, and personnel, and thus be polluted by metal impurities, resulting in excessive metal content on the surface of polysilicon, which in turn leads to polysilicon The quality of the downstream products produced by the product is unqualified, which affects the operating efficiency of the enterprise
In addition, during the crushin

Method used

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  • Silicon block cleaning and drying device
  • Silicon block cleaning and drying device
  • Silicon block cleaning and drying device

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Embodiment 1

[0036] This embodiment provides a silicon block cleaning and drying device, which includes a cleaning unit, a drying unit and a cooling unit.

[0037] The cleaning unit is used to clean the surface of the crushed silicon block to remove surface residues (metal impurities and silicon powder) and scratches; the drying unit is used to clean the silicon block after cleaning. The drying process is to thoroughly dry the moisture on the surface; the cooling unit is used to cool the dried silicon block to a temperature suitable for the downstream packaging process.

[0038] The silicon block washing and drying device described in this embodiment can not only remove the residue on the surface of the silicon block, but also dry the moisture on the surface of the silicon block, and can also cool the silicon block to a temperature suitable for packaging.

Embodiment 2

[0040] This embodiment provides a silicon block cleaning and drying device, such as Figure 1~6 As shown, the silicon block cleaning and drying device includes a cleaning unit 100 , a drying unit 500 , a cooling unit 600 , a conveying unit 300 and a material basket 400 . The arrows in the figure indicate the forward direction of the basket 400 .

[0041] In this embodiment, the crushed silicon blocks from the feedway of the silicon crushing system are placed in the material basket 400 . The material basket 400 is made of PP (Polypropylene, polypropylene) material or PVDF (Poly (vinylidene fluoride), polyvinylidene fluoride) material injection molding, and its 5 panels (ie front panel, rear panel, left panel, right panel and bottom panel) ) are evenly arranged with holes with a diameter of 3 to 5 mm, and the hole spacing is about 10 mm. The length of the material basket 400 is about 1000mm, the width is about 500mm, the height is about 200mm (not including the hook part), and...

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Abstract

The invention provides a silicon block cleaning and drying device. The silicon block cleaning and drying device comprises a cleaning unit, a drying unit and a cooling unit, wherein the cleaning unit is used for conducting cleaning treatment on the surface of a silicon block after being broken, the drying unit is used for conducting drying treatment on the silicon block after cleaning is completed, and the cooling unit is used for conducting cooling treatment on the silicon block after drying is completed. According to the silicon block cleaning and drying device, the silicon block can be sufficiently cleaned to remove residue and scratches on the surface of the silicon block.

Description

technical field [0001] The invention relates to the technical field of silicon production, in particular to a silicon block cleaning and drying device. Background technique [0002] Polysilicon is the building block material for the solar photovoltaic industry. At present, the production of polysilicon mainly adopts the improved Siemens method (that is, the reduction method of trichlorosilane), which refers to the use of vapor deposition method in the reduction furnace through H 2 to reduce SiHCl 3 Thereby preparing polysilicon rods, the specific reaction equation is: [0003] 3SiHCl 3 +H 2 →2Si+5HCl+SiCl 4 [0004] The polycrystalline silicon rods produced by the improved Siemens method are transported to the product finishing process through the transfer box, and the silicon rods are first taken out of the transfer box, and then on a specific platform, the rod-shaped products are broken into a certain linear size that meets the customer's requirements. lumpy product...

Claims

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Application Information

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IPC IPC(8): B08B3/12B08B3/08B08B11/04C30B33/00
CPCB08B3/08B08B3/123B08B11/04C30B33/00
Inventor 马永飞俞仕伟杨宝辉银波何永健陈国辉李锦春
Owner 新疆新特新能材料检测中心有限公司
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