Large-aperture uniform optical filter and method for preparing same
A filter and uniformity technology, applied in the direction of filters, optics, optical components, etc., can solve the problems of high sensitivity and decreased filter transmittance, achieve uniformity improvement, shorten plating time, effect of control
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[0031] The present invention will be described in detail below in conjunction with the accompanying drawings and examples.
[0032] In order to make the purpose, content, and advantages of the present invention clearer, the specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.
[0033] The method can be used to make a double-cavity optical filter with a center wavelength of 532nm, and is also applicable to other optical filter films of any wavelength.
[0034] 1) Using fused silica with a diameter of Φ40mm and a thickness of 1mm as the substrate, the selected film material is mainly high refractive index material tantalum pentoxide (Ta 2 o 5 ) thin film and low refractive index material silicon dioxide (SiO 2 ) film, design reference wavelength λ0=532nm, unit optical thickness is 133nm.
[0035] 2) Through single-layer thin film experiments, Ta 2 o 5 Refractive inde...
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