Self-cleaning mask box

Abstract

The invention relates to the field of liquid crystal display manufacturing, and discloses a mask box capable of achieving the self-cleaning function. The mask box comprises a box body and a cover body. The cover body comprises a pair of sliding rails and a support stretching across the sliding rails. The support is provided with a sprayer and a guide rail matched with the sprayer. The sprayer is connected with an air channel and used for spraying air into a photomask in the box body, so that impurities on the photomask are cleaned up. The sprayer can move freely both in the first direction andin the second direction, and thus all the ranges of the photomask are covered. Cleaners can observe the photomask via an inspection window on the cover body, and the sprayer is moved to the positionswith the impurities for blowing air. The process of a series of motions of putting the photomask onto a special photomask cleaning machine and then carrying out grabbing, overturning and the like isomitted, time consumption of cleaning preparation work is reduced, the cleaning process is simplified, equipment of the special photomask cleaning machine on a production line can further be eliminated, and the space and cost are saved.

Description

technical field [0001] The invention relates to the field of liquid crystal display manufacture, in particular to storage and cleaning of a photomask for liquid crystal display exposure. Background technique [0002] In the manufacture of liquid crystal displays, it is necessary to use a photomask for exposure. A photomask, also known as a mask plate, is a special light-transmitting material with a specific pattern printed on it. The light passes through the photomask to print the graphics on the photomask onto the glass. Exposure is an extremely precise process that requires extremely high cleanliness in production. Subtle dirt or impurities on the surface of the mask will affect the light transmittance, resulting in changes in line width or film thickness, forming defects or mura, and affecting the quality of batch products. [0003] The reticle box is usually used in the storage and transportation of the reticle, and the reticle box is usually sealed to protect the retic...

AI Technical Summary

Problems solved by technology

[0004] There are some deficiencies in the existing photomask storage and use methods. On the one hand, the cleanliness of the photomask storage box is not enough. The simple cover method leads to poor airtightness, and the stainless steel storage box has poor shock absorption, which makes the handling process slightly difficult. There are bumps and dust that can easily enter the box

On the other hand, although the photomask cleaning machine can better guarantee the safety of the photomask cleaning process, compared with only the turning mechanism and air gun blowing function, the structure of the whole equipment is too complicated, resulting in waste of space and cost

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