Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Excimer laser annealing equipment

A technology of excimer laser and annealing equipment, applied in laser welding equipment, lasers, welding equipment, etc., can solve the problems of uneven gas atmosphere, uneven quality of polysilicon layer, etc., to reduce mura defects, improve uniformity and crystallization The effect of reducing the gas concentration difference

Active Publication Date: 2018-02-16
BOE TECH GRP CO LTD +1
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The embodiment of the present invention provides an excimer laser annealing equipment, which solves the problem of uneven quality of the formed polysilicon layer caused by the uneven gas atmosphere in the laser output channel

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Excimer laser annealing equipment
  • Excimer laser annealing equipment
  • Excimer laser annealing equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0028] The uniformity of the gas in the laser output channel has a crucial influence on the crystallization quality of amorphous silicon (α-Si) into polysilicon (poly-silicon). refer to figure 1 , Figure 2(a) and Figure 2(b), figure 1 It is a schematic diagram of the gas atmosphere distribution in the laser output pipeline 10, and it can be seen that the gas concentration at both ends of the laser output channel 10 is very different from the gas concentration...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The embodiment of the invention provides excimer laser annealing equipment, and relates to the technical field of display. The excimer laser annealing equipment solves the problem that the quality ofthe formed polysilicon layer is not uniform because the gas atmosphere is not uniform in a laser output channel. The excimer laser annealing equipment includes a bar-shaped laser output channel whichincludes two end surfaces and side surfaces which are connected with the two end surfaces. The excimer laser annealing equipment also includes at least one air inlet pipe at the side surfaces, and airinlet pipes at the end surfaces, wherein the air inlet pipes are used for input gas to the laser output channel. The excimer laser annealing equipment is used for improving the uniformity of the gasatmosphere in the laser output channel.

Description

technical field [0001] The invention relates to the field of display technology, in particular to excimer laser annealing equipment. Background technique [0002] The polysilicon layer in existing display devices is usually formed by an Excimer Laser Annealing process. Excimer laser annealing specifically uses the excimer laser beam emitted by the excimer laser annealing equipment to irradiate the amorphous silicon layer on the substrate to be treated for a short time to recrystallize it into a polysilicon layer. [0003] The quality of the excimer laser annealing process determines the process quality of transforming amorphous silicon into polysilicon. In the existing excimer laser annealing equipment, the laser light emitted by the laser generator is injected into the laser output channel, and then transmitted and emitted from the laser output channel. Since the existing strip-shaped laser output channel is only provided with an air intake line on the side of the laser o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L21/02H01S3/036
CPCH01L21/02678H01S3/036H01L21/02595H01L21/02686H01L21/02532B23K26/0604H01L21/67115B23K26/0006H01L21/02675H01L21/02592B23K26/14B23K26/354
Inventor 张宇吕祖彬谢银
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com