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Restoration Method of Optical Proximity Correction

A technology of optical proximity correction and repair method, which is applied in the repair field and can solve problems such as difficulty and complexity of technical implementation

Active Publication Date: 2020-11-03
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, as feature sizes continue to shrink, such techniques become increasingly difficult and complex to implement

Method used

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  • Restoration Method of Optical Proximity Correction
  • Restoration Method of Optical Proximity Correction
  • Restoration Method of Optical Proximity Correction

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Embodiment Construction

[0028] In order to make the above and other objectives, features, and advantages of the present disclosure more obvious and understandable, preferred embodiments are listed below in conjunction with the drawings in the specification, and detailed descriptions are as follows:

[0029] The following disclosure provides many different embodiments or examples to implement different features of this case. The following disclosure describes specific examples of various components and their arrangement to simplify the description. In addition, different examples of the following publications may reuse the same reference symbols and / or marks. These repetitions are for the purpose of simplification and clarity, and are not used to limit the specific relationship between the different embodiments and / or structures discussed.

[0030] Various changes of the embodiment are described below. Through the various views and the illustrated embodiments, similar element numbers are used to identify...

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Abstract

The invention provides a repairing method of optical proximity correction. At least one hot point marking region is obtained according to a first layout of a semiconductor wafer. According to the hotpoint marking region, a region to be repaired and a hot-point-free region are obtained in the first layout, wherein the region to be repaired comprises the hot point marking region. The region to be repaired is divided into a plurality of templates. A repairing program is carried out on each template. A second layout is provided according to each repaired template and the hot-point-free region.

Description

Technical field [0001] The present disclosure relates to a repair method, and particularly relates to a repair method of optical proximity correction of a semiconductor photomask. Background technique [0002] Today, the semiconductor integrated circuit (IC) industry is a rapidly growing industry. In the evolution of integrated circuits, functional density (that is, the number of interconnected components per unit chip area) has become common as the feature size (that is, the smallest component or line width that can be produced using a manufacturing process) decreases To increase. The process of miniaturization of integrated circuits can improve production efficiency and reduce related costs, thereby providing benefits. However, the process of miniaturization of integrated circuits also increases the complexity of integrated circuit manufacturing. Therefore, the same development is required in the processing and manufacturing of integrated circuits. [0003] For example, litho...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/72G03F1/36
CPCG03F1/36G03F1/72
Inventor 吴秉杰池明辉江嘉评吴俊宏吴明轩黄文俊刘如淦
Owner TAIWAN SEMICON MFG CO LTD
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