Texture regulation and control method and device of external energy field module to high throughput thin film

An energy field and high-throughput technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve problems such as low degree of crystallization, poor density, and fuzzy intercrystalline interface

Inactive Publication Date: 2018-03-30
UNIV OF SCI & TECH BEIJING
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

But to study the surface, the energy of the electric field and magnetic field has a great influence on the microstructure and morphology of the film
For example, when the target voltage is high, the cross-sectional morphology of the film is columnar crystals, and the interface between adjacent columnar crystals is blurred and the structure is dense. The XRD diffraction pattern shows that the film has a crystal structure and obvious preferred orientation; When deposited on the bottom, no obvious structure can be seen in the cross-sectional morphology of the film, and there are obvious defects such as voids, and the density is poor. The steamed bun-shaped "amorphous bag" can be seen through the XRD diffraction pattern, indicating that the film as a whole is amorphous at this time. , the degree of crystallization is low

Method used

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  • Texture regulation and control method and device of external energy field module to high throughput thin film
  • Texture regulation and control method and device of external energy field module to high throughput thin film
  • Texture regulation and control method and device of external energy field module to high throughput thin film

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Embodiment 1

[0056] The substrate for preparing thin film samples is 304 stainless steel, and the substrate size is 100mmX 40mmX2mm. A layer of thin film with composition gradient is prepared on the substrate by the magnetron co-sputtering method of Cr target and Ni target, and the movement of the mask and the regulation of the target voltage The films on the surface of the substrate are deposited sequentially from left to right. The width of the mask slit is 5 mm, and the deposition time at each position is 30 minutes. Films with different deposition times have different target voltages, so films with different deposition times and deposition positions have different composition and microstructure. After the high-throughput thin film is prepared, use XRD and scanning electron microscopy to observe the surface and cross-sectional morphology, the crystal state of the thin film, and measure the composition distribution. Finally, the wire beam electrode is used to measure the potential and cur...

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Abstract

The invention relates to a high throughput preparation method for thin film ingredients and textures by adding an energy field module to complete high throughput thin film ingredient and microscopic structure regulation and control in the thin film sedimentation process, and in particular to a texture regulation and control method and device of the external energy field module to high throughput thin films. High throughput screening of the high throughput thin film ingredients and textures is achieved. Test instruments include a mask control system, an external energy field controller, an XRDanalysis meter and a field emission scanning electron microscope. A double-target magnetic control co-sputtering method is adopted for preparing thin film samples with the ingredients and textures changed in a gradient manner, the thin films at different positions on a base surface are subject to sedimentation at different times through mask motion and external energy field changes, the thin filmssubject to sedimentation firstly and the thin films subject to sedimentation secondly have different ingredients and microscopic structures, and finally the ingredients and texture structures with the best performance are screened according to the using performance high throughput characterization technique.

Description

technical field [0001] The invention belongs to the field of high-flux composition and microstructure regulation of thin films, and specifically relates to a method of controlling high-flux thin film composition and microstructure by adding energy field modules (such as electric field, magnetic field and microwave field, etc.) during the thin film deposition process. Changes in microstructure, enabling high-throughput preparation methods for thin film composition and organization. Background technique [0002] High-throughput preparation of thin films refers to the simultaneous preparation of hundreds or thousands of thin films with different components on one substrate through ingenious experimental design. This preparation method is of great significance for the development of new materials, so that the material research is no longer carried out according to the characterization mode of one sample corresponding to one component. The 21st century is a period of information...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/04
CPCC23C14/352C23C14/042C23C14/354
Inventor 庞晓露杨杨高克玮杨会生徐秋发李东东童海生
Owner UNIV OF SCI & TECH BEIJING
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