Texture regulation and control method and device of external energy field module to high throughput thin film
An energy field and high-throughput technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve problems such as low degree of crystallization, poor density, and fuzzy intercrystalline interface
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[0056] The substrate for preparing thin film samples is 304 stainless steel, and the substrate size is 100mmX 40mmX2mm. A layer of thin film with composition gradient is prepared on the substrate by the magnetron co-sputtering method of Cr target and Ni target, and the movement of the mask and the regulation of the target voltage The films on the surface of the substrate are deposited sequentially from left to right. The width of the mask slit is 5 mm, and the deposition time at each position is 30 minutes. Films with different deposition times have different target voltages, so films with different deposition times and deposition positions have different composition and microstructure. After the high-throughput thin film is prepared, use XRD and scanning electron microscopy to observe the surface and cross-sectional morphology, the crystal state of the thin film, and measure the composition distribution. Finally, the wire beam electrode is used to measure the potential and cur...
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