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Elevator for wafer etching

A lifting device and wafer technology, which is applied in the manufacture of electrical components, circuits, semiconductors/solid-state devices, etc., can solve the problems of high etching rate at the bottom of the wafer and low etching rate at the top of the wafer, and achieve the goal of improving the surface quality of the wafer Effect

Active Publication Date: 2021-01-26
YANGTZE MEMORY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the wafer etching process is short, the etching unevenness of the wafer surface is not obvious, but when the wafer is soaked in the acid bath solution for a long time, the etching unevenness of the wafer surface will stand out as a high etch rate at the bottom of the wafer and a low etch rate at the top of the wafer

Method used

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  • Elevator for wafer etching
  • Elevator for wafer etching
  • Elevator for wafer etching

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Embodiment Construction

[0024] Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided for more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

[0025] figure 1 It is a front view structural schematic diagram of an embodiment of the present invention. figure 2 for figure 1 The schematic diagram of the side view structure of the embodiment. image 3 for figure 1 The top view of the embodiment. As shown in the figure, the lifting device for wafer etching in this embodiment includes a lifting rod 11, a first support member 12 and a second support member 13, and the first ...

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Abstract

The invention belongs to the technical field of semiconductors, and in particular relates to a lifting device for wafer etching. The lifting device for wafer etching according to the present invention includes a lifting rod and a support fixedly connected with the lifting rod, and a gear transmission unit is provided on the lifting rod and the supporting member. A guiding unit for supporting and rotating the wafer is also provided on the supporting member, and the output end of the gear transmission unit is connected with the input end of the guiding unit, so as to drive the guiding unit to complete the rotation of the wafer. By using the lifting device for wafer etching of the present invention, the wafer in the etching process can be rotated, the wafer surface can be uniformly etched effectively, and the quality of the wafer surface can be improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductors, and in particular relates to a lifting device for wafer etching. Background technique [0002] In the prior art, when etching a wafer in a wet process, the entire wafer needs to be immersed in a wafer etching reaction tank and fixed on a wafer support. Since the acid solution in the acid tank of the immersion cleaning machine is always supplied from the bottom of the reaction tank and overflows from the top of the reaction tank, and during this process, the acid solution has been reacting with the film on the wafer, so the acid The local concentration at the top of the tank will be lower than the concentration at the bottom of the acid tank, which means that the acid etching rate at the bottom of the acid tank is higher than that at the top of the acid tank. When the wafer etching process is short, the etching unevenness of the wafer surface is not obvious, but when the wafer is soaked in...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/687
CPCH01L21/68742H01L21/68792
Inventor 李君
Owner YANGTZE MEMORY TECH CO LTD
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