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A method for preparing a rotating target with an adaptive buffer layer

A buffer layer and self-adaptive technology, applied in coating, metal material coating process, vacuum evaporation plating, etc., can solve problems such as target cracking

Active Publication Date: 2019-10-15
FUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to provide a method for preparing a rotating target with an adaptive buffer layer to solve the problem of target cracking when preparing a rotating target by hot isostatic pressing

Method used

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  • A method for preparing a rotating target with an adaptive buffer layer
  • A method for preparing a rotating target with an adaptive buffer layer
  • A method for preparing a rotating target with an adaptive buffer layer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] Example 1: Pure silicon target

[0039] The lining pipe is made of 304 stainless steel. At the same time, the buffer layer material powder is selected, and the thermal expansion coefficient of the material selected for the buffer layer is between 304 stainless steel and the silicon target body, and does not affect heat conduction. Then the porous self-adaptive ring-shaped buffer layer is prepared by thermal spraying, and the thickness of the buffer layer is guaranteed to be 1 / 5-1 / 7 of the thickness of the silicon target body. The outer casing is made of ordinary carbon steel sheet, welded and assembled, and inspected by ultrasonic flaw detection and penetrant flaw detection before loading. Use silicon powder with an average particle size of 50-75μm. The purity of the silicon powder is not less than 99.9%, and the oxygen content must be less than 250PPm. Calculate the required silicon powder weight according to the thickness and length of the prepared rotating target. ...

Embodiment 2

[0040] Example 2: Si-aluminum alloy target

[0041] The lining pipe is made of 304 stainless steel. At the same time, the buffer layer material powder is selected, and the thermal expansion coefficient of the material selected for the buffer layer is between 304 stainless steel and the silicon-aluminum alloy target body, and does not affect heat conduction. Then prepare the porous self-adaptive ring-shaped buffer layer by thermal spraying, and ensure that the thickness of the buffer layer is 1 / 5-1 / 7 of the thickness of the silicon-aluminum alloy target blank. The outer casing is made of ordinary carbon steel sheet, welded and assembled, and inspected by ultrasonic flaw detection and penetrant flaw detection before loading. Use silicon powder with an average particle size of 50-75μm, the purity of the silicon powder is not less than 99.9%, and the oxygen content must be lower than 250PPm, and the aluminum powder with an average particle size of 20μm, the purity of the aluminum...

Embodiment 3

[0042] Example 3: Niobium oxide target

[0043] The lining pipe is made of 304 stainless steel. At the same time, the buffer layer material powder is selected, and the thermal expansion coefficient of the material selected for the buffer layer is between 304 stainless steel and the niobium oxide target body, and does not affect heat conduction. Then the porous self-adaptive annular buffer layer is prepared by thermal spraying, and the thickness of the buffer layer is guaranteed to be 1 / 5-1 / 7 of the thickness of the niobium oxide target blank. The outer cover is made of ordinary carbon steel sheet. After welding and assembly, before loading, it is inspected by ultrasonic flaw detection and penetrant flaw detection. Use niobium oxide powder with an average particle size of 80-100μm, usually the purity of niobium oxide powder is 3N5 (99.95%) must be guaranteed not less than 99.95%, the oxygen content is about 300PPm, you can add a small amount according to niobium oxide: tantalu...

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Abstract

The invention discloses a preparation method of a rotary target material comprising an adaptive buffering layer. The internal structure of the buffering layer is porous, and the exterior structure ofthe buffering layer is in a ring shape (is cylindrical). Firstly, an adaptive buffering layer of which the thickness is 1 / 5 to 1 / 7 of the thickness of a target material green body, the yield strengthis high (higher than a hot isostatic pressure), the thermal expansion coefficient is moderate (between the thermal expansion coefficient of the target material green body and the thermal expansion coefficient of a substrate), the thermal conductivity is good and the porosity factor is 30% to 40% is prepared on the surface of the substrate by adopting a thermal spraying method; and subsequently, the target material green body is prepared on the surface of the adaptive buffering layer by adopting a hot isostatic pressure method. The porous buffering layer has a mechanical self-compensation function; when the adaptive buffering layer and the target material green body are in hot isostatic pressure and cooling processes, the thermal mismatch strain, caused in hot pressing and cooling processes, between the target material green body and a substrate interface can be effectively absorbed by changes of the internal average pore diameter in the porous buffering layer, so the effect of protecting the target material from cracking is played.

Description

technical field [0001] The invention relates to the technical field of photoelectric material forming, in particular to a method for preparing a rotating target with an adaptive buffer layer. Background technique [0002] In recent years, with the maturity of liquid crystal technology and the huge development of the display industry, the entire target market has ushered in a blowout development. During the use of domestic planar targets, problems such as uneven deposition of films and low utilization rates have plagued target manufacturers and suppliers. The utilization rate of planar targets is very low, generally about 30%. In order to improve the target The utilization rate of the target can be reduced, the cost can be reduced, and the raw material can be saved. The coating equipment company has developed a rotating target, which can increase the utilization rate of the target to about 70%. Among the magnetron sputtering targets, the rotating target is favored due to its...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C23C14/35
Inventor 李强谈耀宏
Owner FUZHOU UNIV
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