Real-time on-line monitoring method for polishing solution large particles in polishing process
A polishing liquid, large particle technology, applied in particle and sedimentation analysis, measuring device, particle size analysis and other directions, can solve the problems of yield limit, low production efficiency, high production cost, and achieve the effect of improving accuracy
Inactive Publication Date: 2018-05-18
ZHEJIANG UNIV OF TECH
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[0008] In view of the fact that the existing polishing equipment does not have an online monitoring system for large particles of polishing fluid, and generally adopts a passive after-the-fact detection method, the improvement of the yield rate is greatly limited, the production cost is high, and the production efficiency is low. Limitations of Large Particle Detection Methods
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[0021] The present invention will be further described below in conjunction with the accompanying drawings.
[0022] refer to figure 1 and figure 2 , a method for real-time on-line monitoring of large particles of polishing liquid in a polishing process, the equipment for realizing the method for real-time on-line monitoring of large particles of polishing liquid includes a main pipeline for polishing liquid 1, a valve for a branch channel of polishing liquid 3, a dilution mixing system 5, and an air bubble Elimination system 6, sample pool 7, laser sheet light source 8, scattered light detector 9 and light attenuation detector 10, described polishing liquid main pipeline 1 is connected with dilution mixing system 5 through polishing liquid branch channel valve 3, and described dilution mixing system 5 is connected with the bubble elimination system 6, the outlet of the dilution mixing system 5 is connected with the sample pool 7, one side of the sample pool 7 is a laser sh...
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Abstract
The invention relates to a real-time on-line monitoring method for polishing solution large particles in a polishing process. The method includes the steps of: (1) sampling: extracting a detection sample from a polishing solution supply main pipeline through a sampling system, which is realized by vacuum technology; (2) dilution: adding a certain amount of deionized water into the detection samplefor complete dilution; (3) bubble elimination: eliminating bubbles from the detection sample by vacuum pumping; and (4) detection: letting the polishing solution pass through an observation window and starting large particle detection. The method provided by the invention realizes high efficiency, high accuracy and high precision detection of particles in the polishing solution.
Description
technical field [0001] The invention relates to ultra-precision machining, in particular to a real-time on-line monitoring method for large particles of polishing liquid in the process of precision ultra-precision polishing. Background technique [0002] The size of the abrasive grains in the polishing liquid has a decisive effect on the surface integrity of the polishing process. The large particles in the polishing liquid (particles larger than the abrasive grains used) are micro-defects such as scratches / pits on the processed surface , the root cause of limited surface integrity. Studies have shown that when there are particles of more than 1 μm in the polishing liquid (the size of the abrasive grains for polishing is usually 30nm to 200nm), surface defects such as scratches and pits often appear on the processed surface. At the same time, the surface integrity can be significantly affected even at extremely low levels of one part in 100,000 by the number of large partic...
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Inventor 楼飞燕吕冰海王志伟邓乾发陈士豪贺乾坤
Owner ZHEJIANG UNIV OF TECH