Washing device

A cleaning device and technology to be cleaned are applied in the directions of cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., which can solve the problem that the substrate polishing liquid cannot be thoroughly cleaned, and the substrate yield is reduced. The use of organic electroluminescent devices effect and other issues, to avoid the deterioration of the use effect, facilitate wide application, and improve the convenience of use

Inactive Publication Date: 2018-06-29
ZAOZHUANG VISIONOX ELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, the method of cleaning the polished substrate is generally to use the lowest-cost pure water cleaning, but the residual polishing solution on the surface of the subst

Method used

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Experimental program
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Embodiment

[0047] An embodiment of the present invention provides a cleaning device, which is mainly used for cleaning a polished substrate. like Figure 1-2 As shown, it includes a transport mechanism 1 and an ultrasonic cleaning unit 4 , a liquid medicine cleaning unit 6 , a two-fluid cleaning unit 7 , a pure water cleaning unit 8 and a drying unit 9 arranged in sequence along the first direction.

[0048] The conveying mechanism 1 is used for conveying the substrate to be cleaned along a first direction. Among them, the first direction refers to the figure 1 The direction of the pipeline of the cleaning device.

[0049] As a preferred embodiment, such as figure 2 As shown, the conveying mechanism 1 includes a conveying member 101 and a driving member 102 . in,

[0050]The transport member 101 is used to place the substrate to be cleaned. In this embodiment, the conveying member 101 may include conveying rollers arranged at intervals along the first direction.

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Abstract

The invention relates to the technical field of base plate washing, and discloses a washing device, which comprises a conveying mechanism for conveying a base plate to be washed along a first direction, and an ultrasonic washing unit, a drug liquid washing unit, a two-fluid washing unit, a pure water washing unit and a drying unit opposite to the conveying mechanism and sequentially arranged alongthe first direction. Therefore, the washing device is used for washing the base plate to be washed through multiple washing steps, so that a polishing solution remained on the surface of the base plate can be thoroughly washed, the yield of the base plate is improved, and the occurrence of the phenomenon that a use effect of an organic electroluminescence device is poorer due to the polishing solution remained on the base plate is avoided.

Description

technical field [0001] The invention relates to the technical field of substrate cleaning, in particular to a cleaning device. Background technique [0002] With the development of information technology, organic electroluminescent devices have become one of the most concerned technologies in flat panel display technology because of their advantages such as high contrast, wide viewing angle, low power consumption, and thin volume. [0003] In the process of manufacturing the organic electroluminescent device, in order to planarize the substrate of the organic electroluminescent device, it is usually subjected to a chemical mechanical polishing (CMP) process. The chemical mechanical polishing process uses the principle of "soft grinding and hard" in wear. First, a layer of polishing liquid liquid film is formed on the substrate to be polished. The chemical components in the polishing liquid chemically react with the surface material of the substrate to convert insoluble subst...

Claims

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Application Information

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IPC IPC(8): B08B3/12B08B3/08B08B3/02B08B13/00
CPCB08B3/123B08B3/022B08B3/041B08B3/08B08B13/00
Inventor 曹瑞丰
Owner ZAOZHUANG VISIONOX ELECTRONICS TECH CO LTD
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