Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sand cultivation mode

A yellow sand and pattern technology, applied in cultivation, plant cultivation, planting substrates, etc., can solve problems such as soil continuous obstacles, low temperature stress, and low yield per unit area, and achieve the effects of avoiding water pollution, blocking water and fertilizer loss, and reducing water evaporation

Active Publication Date: 2018-07-06
TARIM UNIV
View PDF2 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the production process of protected areas in southern Xinjiang, there are problems such as serious soil salinization, low temperature stress in winter and spring, soil connection barriers, high cost of soilless culture substrates, low yield per unit area, and low utilization rate of water and fertilizer resources.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0010] In order to make the objects and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0011] The embodiment of the present invention provides a yellow sand cultivation planting mode, which is suitable for open field and protected crop cultivation, and is widely used in protected crop cultivation, and specifically includes the following steps:

[0012] S1. According to the planting area cultivated in the protected area and the requirements of crop growth for plant spacing, row spacing and root growth space, dig a planting ditch 8m long, 0.4m wide, 0.3m deep on the inner side, and 0.35m deep on the outer side in the protected area. The distance between the ditches is 0.8m (as a channel for field management), and a drainage ditch wi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a sand cultivation mode, comprising the steps of setting planting ditches in a protected land, wherein the planting ditches are 0.8 m spaced, and a drain ditch 0.35 m in depthis arranged at the outer side of each planting ditch; covering the inside of the drain ditches with mulch, fixing well, and setting an underground liquid reservoir at the tail end, except for the cultivation area, of the protected land; allowing water in the planting ditches to smoothly flow from inside to outside, and covering the inside of the planting ditches evenly with HDPE (high-density polyethylene) to tightly wrap the two sides, inner side and outer side of the planting ditches; mixing well slag and sand in the mass ratio of 3:5, spreading the mixture evenly into the planting ditches,laying substrate, using water mixed with a disinfectant to irrigate the planting ditches by flooding, and washing the substrate twice; laying dripper tubes above the substrate, and covering with mulch. The sand cultivation mode has low input cost; the slag and sand can be taken in situ; the sand cultivation mode is simple to perform and is easy for common people to accept; the sand cultivation mode provides better convenience and high speed, and saves time and labor.

Description

technical field [0001] The invention relates to the field of plant planting, in particular to a yellow sand planting mode. Background technique [0002] Xinjiang is located in the northwest border of the motherland, with a fragile ecological environment and harsh natural environment. In the production process of protected areas in southern Xinjiang, there are problems such as serious soil salinization, low temperature stress in winter and spring, soil connection barriers, high cost of soilless culture substrates, low yield per unit area, and low utilization rate of water and fertilizer resources. In southern Xinjiang, there are more sunny days and less cloudy days, drought and less rain, long exposure time, more accumulated temperature, short frost period, large temperature difference between day and night, large desert area, serious land salinization, more than 14-16 hours of sunshine all day, and sunshine all year round. 2550-3500h. The solar radiation energy is very ric...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01G22/00A01G24/17A01G24/10A01G13/02
CPCA01G13/0275
Inventor 谭占明杜红斌徐崇志轩正英张娟阿依买木·沙吾提刘义飞郭玲侯彦忠赵劲飞
Owner TARIM UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products