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Position precision compensation method of ultra-precision two-dimensional motion platform system

A two-dimensional motion platform and motion platform technology, which are applied in the field of ultra-precision two-dimensional motion platform system position accuracy compensation and ultra-precision motion platform system, can solve the problems of insufficient accuracy of ordinary methods and strict position requirements, and achieve improved position accuracy. , the effect of reducing costs

Inactive Publication Date: 2018-07-20
HEFEI CHIP FOUND MICROELECTRONICS EQUIP CO LTD
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Problems solved by technology

However, in order to obtain the accurate coordinate position of the pattern mark, the requirements for the position of the calibration plate are very strict, and the accuracy of the ordinary method is not enough

Method used

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  • Position precision compensation method of ultra-precision two-dimensional motion platform system
  • Position precision compensation method of ultra-precision two-dimensional motion platform system
  • Position precision compensation method of ultra-precision two-dimensional motion platform system

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Embodiment Construction

[0025] A preferred embodiment of the present invention will be described in detail below with reference to the accompanying drawings.

[0026] Such as figure 1 As shown, the position accuracy compensation method of the ultra-precision two-dimensional motion platform system includes the following specific steps:

[0027] S1. Select an optical calibration mask with a small processing error, which is mainly to etch a cross pattern or other symmetrical patterns that are evenly spaced in the horizontal and vertical directions on the chrome-plated quartz glass plate through an etching process, and then Place it within the area to be calibrated on the motion platform. In this embodiment, the horizontal and vertical spacing of the pattern is 5 mm, and the length and width of the calibration plate are both 140 mm, but it is not limited to this size, and a finer and wider range can be achieved.

[0028] S2. Use the CCD camera vision system to obtain the actual coordinate data of the c...

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Abstract

The invention provides a position precision compensation method of an ultra-precision two-dimensional motion platform system. On the basis of processing by a fitting method, a placement error of a calibration plate and a systematic error of a platform are separated to realize position precision compensation of the platform. Therefore, a defect of the existing ultra-precision two-dimensional motionplatform system position precision compensation method is overcome; and thus harsh requirements on the ambient temperature and the placement position of the calibration plate are reduced.

Description

technical field [0001] The invention relates to the technical field of ultra-precision machining and measurement, in particular to a method for position accuracy compensation of an ultra-precision two-dimensional motion platform system, which is applied to an ultra-precision motion platform system for direct writing lithography. Background technique [0002] With the rapid development of ultra-precision machining and measurement technology, ultra-precision motion platforms are also being more and more widely used in the field of direct writing lithography, and the requirements for the positional accuracy of motion platforms are also getting higher and higher. For example, for a two-dimensional motion platform, the main error comes from the system error of the motion platform, such as the motion accuracy of the servo motor, the installation accuracy of the guide rail, and the accuracy of the feedback measurement components, etc. will cause system errors. Correcting the system...

Claims

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Application Information

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IPC IPC(8): G01B11/00
CPCG01B11/002
Inventor 黄胜洲
Owner HEFEI CHIP FOUND MICROELECTRONICS EQUIP CO LTD
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