Method for etching anode film layer and display panel thereof
A technology of anode film and film layer, which is applied in the manufacture of electrical components, electric solid-state devices, semiconductor/solid-state devices, etc., and can solve the problems of metal connection line etching and contact.
Active Publication Date: 2018-08-28
YUNGU GUAN TECH CO LTD
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Problems solved by technology
[0005] Embodiments of the present invention provide a method for etching an anode film layer and a display panel prepared by applying the method, which are used to solve the problems caused by the etching liquid and the anode film layer in the prior art when etching the anode film layer. The metal connection line is in contact, so that the metal connection line under the anode film layer is etched
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[0026] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be clearly and completely described below in conjunction with specific embodiments of the present invention and corresponding drawings. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0027] The technical solutions provided by various embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0028] In order to solve the problem in the prior art that when etching the anode film layer, the etching solution will contact the metal connection wire under the anode film layer, thereby causi...
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The invention discloses a method for etching an anode film layer so that a problem that a metal connecting wire under an anode film layer is etched because of the contact between an etching solution and the metal connecting wire under the anode film layer during etching of the anode film layer in the prior art can be solved. The method comprises: carrying out first etching on an anode film layer by using first liquid medicine and removing a top conductive oxide film layer and a metal conductive film layer in the anode film layer; and carrying out secondary etching on the anode film layer afterthe first etching by using a second liquid medicine to remove a bottom conductive oxide film layer in the anode film layer. The second soup is selected from one or more kinds of mixed liquid medicines among the liquid medicines not damaging the metal connecting wire. In addition, the invention also discloses a display panel.
Description
technical field [0001] The invention relates to the field of display technology, in particular to a method for etching an anode film layer and a display panel thereof. Background technique [0002] With the development of display technology, new display products emerge in an endless stream. Among them, organic light-emitting display panels have been identified as the most promising display panels for the next generation due to their advantages such as fast response speed, high contrast ratio, and wide viewing angle. [0003] In the prior art, after forming an anode film layer comprising a top conductive oxide film layer, a middle metal conductive film layer and a bottom conductive oxide film layer (ITO / Ag / ITO) on the anode of the OLED, it is often necessary to The anode film layer is etched to form a patterned anode, so as to realize the electrical connection between the display area and the external circuit. [0004] In the above scenario, the anode film layer is usually ...
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IPC IPC(8): H01L51/56H01L51/52
CPCH10K50/81H10K71/00
Inventor 张田超
Owner YUNGU GUAN TECH CO LTD