Measuring equipment for surface potential of film material
A technology for measuring equipment and thin-film materials, which is applied in the field of power systems, can solve the problems of difficulty in giving parameters such as electron/hole trap energy levels, low sensitivity of trap charge characterization, and difficulty in distinguishing space charges, etc., to achieve easy fabrication and high resolution Efficiency, reasonable design effect
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[0027] The following descriptions of various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be implemented.
[0028] Please refer to figure 1 As shown, the embodiment of the present invention provides a measurement device for the surface potential of a thin film material, including:
[0029] The test box has two openings, one of which is connected to a vacuum pump to provide vacuum conditions for the measurement, and the other is a vent hole for passing in various gases required for the measurement;
[0030] A heating platform arranged in the test chamber is used to provide the required temperature conditions for the measurement;
[0031] a ground electrode positioned above the heating stage and in close contact with the heating stage;
[0032] A needle electrode and a grid electrode arranged in the test chamber, the grid electrode is located between the needle electrode and the ground electrode, the grid ...
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