The invention discloses a measurement
system and a measurement method of a secondary
electron emission yield of
dielectric material. The measurement
system comprises a
Faraday cup and a pulse
electron gun, wherein an
incident beam generated by the pulse
electron gun outside the
Faraday cup irradiates on a sample through an electronic entrance port on a tube, and an automatic
voltage regulator circuit is electrically connected between a sample back
electrode and an earth wire, so that the level on the sample surface is kept constant relative to a
potential difference between the electron guns. The
voltage regulating range of the
voltage adjustor circuit is controlled by a
feedback control circuit in real time, so as to ensure that charging potential of the sample is compensated in real time, and current probes for measuring net collection current and secondary
electron current are respectively connected between the sample and a voltage controlled power source of the
voltage regulator circuit, and connected with the
Faraday cup. According to the measurement
system and the method disclosed by the invention, are simple extra
consumer power equipment such as an
ion source and the like and related experimental links are not needed, the measurement efficiency is high, and the measurement is continuous without stopping to carry out work such as energy dissipation,
surface level measurement and the like after each
irradiation pulse, and the measurement error is small.