6 results about "Surface potential measurement" patented technology

The invention provides a sleeve core surface potential measuring device and method based on an electrostatic probe method. The device comprises a test cavity, a guide rod, a high-voltage wiring assembly, a glass fiber reinforced plastic cylinder, a driving device and a self-movable measuring structure, the side wall of the test cavity is provided with an extraction opening, an inflation opening and a cabin door capable of being opened and closed; the first end of the high-voltage wiring assembly is arranged in the test cavity; the glass fiber reinforced plastic cylinder is arranged in the test cavity; the first end of the guide rod is movably arranged in the glass fiber reinforced plastic cylinder in a penetrating manner and is in sliding connection with the first end of the high-voltage wiring assembly, and the guide rod bears a tested core body; the driving device drives the guide rod to move so as to enable the measured core body to move from the pressurizing position to the measuring position, and drives the guide rod to rotate so as to drive the measured core body to rotate; the measuring structure measures the surface potential of the measured core body at the measuring position. According to the invention, the surface potential of the measured core can be comprehensively scanned, the accuracy of surface potential measurement is improved, and automatic measurement of the measured core can be realized.

The invention discloses a dielectric material surface charge quantitative measurement method and system based on a KPFM-AM mode, and relates to the fields of friction catalysis technologies, friction nano-generators and the like. According to the method, the incidence relation between the surface potential and the surface charge density is deduced by deeply analyzing the vibration characteristics of the probe driven by the electric field force. On the basis, a series of finite element simulation is carried out by using COMSOL software, and the actual measurement process of the KPFM is simulated: on one hand, the applicability of a theoretical formula in an infinite uniform charged surface scene is verified, and on the other hand, the influence rule of a limited surface or a surface with non-uniform charge distribution on a surface potential measurement result is explored. Meanwhile, simulation analysis is conducted on the surface potential distribution of the point charges, and a fitting formula based on a Lorentz function is provided and used for accurate calculation of the surface potential distribution. Finally, on the basis of the theory and simulation results, a special program capable of inversely calculating the surface charge distribution according to the surface potential distribution is developed, and an important theoretical support and a practical tool are provided for efficient and accurate characterization of dielectric material surface electrical properties.

The present application relates to monitoring and monitoring methods for chromium-free anodization sealing processes. A method for in-situ monitoring and optimization of a sealing process, the method comprising: sealing a surface of an anodized substrate, providing a test anodized substrate corresponding to the anodized substrate into the same sealing process as the anodized substrate, measuring an electrochemical surface potential of the test anodized substrate representative of a surface of the anodized component, collecting the electrochemical surface potential measurement data, analyzing the electrochemical surface potential measurement data, and identifying one or more performance indicators related to sealing quality and process parameters. The method can comprise: using information obtained from analyzing the electrochemical surface potential measurement data to optimize the sealing process, measuring the electrochemical surface potential using a potentiostat and a reference electrode, and measuring the electrochemical surface potential of the test anodized substrate representative of a surface of the anodized component.

Provided are a plasma processing apparatus and a control method for ascertaining a state of plasma.　The plasma processing apparatus comprises: a plasma processing chamber; a base disposed in the plasma processing chamber; an electrostatic chuck disposed on an upper portion of the base and including a plurality of divided regions; an attraction electrode disposed in the electrostatic chuck; a heater electrode disposed below the attraction electrode for each of the plurality of divided regions; a heater power supply electrically connected to the heater electrode; a surface potential measurement device electrically connected to the attraction electrode and having a surface potential meter; and a control unit, wherein the control unit calculates a plasma state from a set value of power applied to the heater electrode from the heater power supply and a potential measured by the surface potential meter.

This invention discloses an insulator surface potential measuring device and method, comprising a housing having a sealed cavity, an air inlet, and an exhaust outlet; a high-voltage wiring assembly installed in the housing, with one end of the high-voltage wiring assembly extending into the cavity and the other end connected to a high-voltage power supply; a vacuum pump assembly with one end extending through the housing into the cavity; an electrostatic probe assembly including an electrostatic probe and a driving structure, the electrostatic probe and the driving structure being installed in the cavity and connected; a first central high-voltage conductor assembly disposed in the cavity and connected to one end of the high-voltage wiring assembly; a second central high-voltage conductor assembly disposed in the cavity and opposite to the first central high-voltage conductor assembly; and a first driving assembly, with the second central high-voltage conductor mounted on the first driving assembly. This invention overcomes the limitations of existing technologies in measuring the surface potential of insulators with complex geometries and improves measurement efficiency through the aforementioned control.

This invention discloses a method and system for quantitative measurement of surface charge on dielectric materials based on the KPFM-AM mode, relating to tribocatalysis technology, triboelectric nanogenerators, and other fields. By deeply analyzing the probe vibration characteristics driven by an electric field, this invention derives the correlation between surface potential and surface charge density. Based on this, a series of finite element simulations are conducted using COMSOL software to simulate the actual KPFM measurement process: on the one hand, verifying the applicability of the theoretical formula in the scenario of an infinitely large uniformly charged surface; on the other hand, exploring the influence of finite-sized or non-uniformly charged surfaces on the surface potential measurement results. Simultaneously, simulation analysis is performed on the surface potential distribution of point charges, and a fitting formula based on the Lorentz function is proposed for accurate calculation of the surface potential distribution. Finally, based on the above theory and simulation results, a dedicated program is developed that can inversely calculate the surface charge distribution from the surface potential distribution, providing important theoretical support and practical tools for the efficient and accurate characterization of the surface electrical properties of dielectric materials.