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A repair method for a graphite disk

A repair method and technology for graphite disks, which are applied in ion implantation plating, gaseous chemical plating, coating, etc., can solve the problems of inaccurate detection of graphite disks, inability to identify tiny defects of graphite disks, and inability to repair them.

Active Publication Date: 2018-10-26
DYNAX SEMICON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The embodiment of the present invention provides a method for repairing a graphite disk to solve the problem that when the graphite disk is detected in the prior art, the tiny defects on the graphite disk cannot be identified, the detection of the graphite disk is inaccurate, resulting in the inability to repair, and the service life of the graphite disk is reduced technical issues

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  • A repair method for a graphite disk
  • A repair method for a graphite disk
  • A repair method for a graphite disk

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Embodiment Construction

[0028] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0029] figure 1 It is a flow chart of a method for repairing a graphite disk provided by an embodiment of the present invention, such as figure 1 As shown, it specifically includes the following steps:

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Abstract

The invention discloses a repair method for a graphite dusk. The method is characterized in that: first crack detection is performed on the surface of the graphite disk; when the first crack width ofthe surface of the graphite plate satisfying the first preset crack width is detected, a repair layer is prepared on the surface of the graphite plate, and repair is performed on the graphite plate. Detection is performed on the first crack of the graphite plate, repair is performed on the graphite plates which has the first crack, so that it is guaranteed that the first crack on the surface of the graphite disk can be covered and filled, the graphite plate being eroded by the graphite plate exposure is avoided, the quality of the product influenced by doping carbon is reduced, the preparing properties of the semi-conducting material is improved, the service life of the graphite plate can be prolonged simultaneously, and the risk of the crack of the graphite plate, which is caused by the stress accumulation is prevented.

Description

technical field [0001] Embodiments of the present invention relate to semiconductor manufacturing technology, and in particular to a method for repairing a graphite disk. Background technique [0002] The wafer carrier in metal-organic chemical vapor deposition (Metal-organic Chemical Vapor Deposition, MOCVD) equipment is usually a graphite disc, which includes a graphite support and a coating deposited on the surface of the graphite support. The failure of the graphite disk is mainly due to the difference in physical properties between the two. During the MOCVD deposition process, frequent and large temperature differences under extreme baking conditions often cause the coating to be damaged first, and then the graphite support to be damaged. In addition, the uneven temperature of the large-size graphite disk during the deposition process leads to a sharp increase in the thermal stress of the graphite support and the coating, which leads to damage to the graphite disk coati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/458C23C16/18C23C16/30C23C16/32C23C14/06B23P6/00
CPCB23P6/00C23C14/0635C23C14/0641C23C16/18C23C16/303C23C16/325C23C16/4581
Inventor 周文龙
Owner DYNAX SEMICON
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