A self-cleaning nano colloid jet polishing device

A technology of nano-colloid and polishing device, which is applied in explosion generating device, abrasive feeding device, used abrasive processing device, etc. Continuous and other problems, to achieve the effect of continuous cleaning process, avoiding contact and preventing pollution

CN108818321BActive Publication Date: 2019-05-24NAT UNIV OF DEFENSE TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Publication Date
2019-05-24

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Abstract

The invention discloses a self-cleaning type nano-colloid jet-flow polishing device. A plunger pump (4) is mounted on a first pipeline (1) and a second pipeline (5); a nano-colloid container (1) is connected with the first pipeline (1) and a fifth pipeline (21); a cleaning device (23) is connected with a sixth pipeline (22) and a seventh pipeline (27); a pressurized energy accumulation device (8)is mounted on a third pipeline (7) and a fourth pipeline (9); a cavitation jet-flow spraying nozzle (14) is mounted at the tail end of the fourth pipeline (9); laser sensors (29) are arranged on the third pipeline, the fifth pipeline and the spraying nozzle respectively and are mounted in a non-contact manner. By adopting the self-cleaning type nano-colloid jet-flow polishing device, the problemsof a common nano-colloid jet-flow device that nano-colloid is easy to deposit and easy to pollute, nano-colloid liquid flow cannot be continuously sprayed, the device is uneasy to wash and maintain, and the jet-flow polishing efficiency of an optical element is low and the like are solved; sealed type circulation of a nano-colloid solution is realized.
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Description

technical field

[0001] The invention belongs to the field of ultra-smooth surface processing of optical elements, and in particular relates to a jet polishing device. Background technique

[0002] Nano-colloid jet polishing is a new type of optical component polishing method derived from micro-abrasive jet polishing. Through chemical bonding and fluid shearing, atomic-level removal of optical component surface materials can be achieved. During the removal process, the -OH in the nanocolloid combines with the atoms on the surface of the component to activate the atoms on the surface of the component, and the nanoparticles in the nanocolloid solution combine with the -OH in the nanocolloid, and the nanocolloid particles are sprayed out by the nozzle through their own kinetic energy The conversion of the component surface atoms is firmly combined with chemical bonds. Under the shear force of the nano-colloid fluid, the chemical bonds between the component surface atoms and othe...

Examples

Embodiment Construction

[0031] In order to enable those skilled in the art to better understand the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0032] A self-cleaning nano-colloid jet polishing device, as attached figure 1As shown, it includes a nano-colloid container 1, a first pipeline 2, a first two-position three-way control valve 3, a metering plunger pump 4, a second pipeline 5, a pressure gauge 6, a third pipeline 7, a booster Pressure accumulator 8, fourth pipeline 9, bracket 10, fixing device 11, first axial guide rail 12, gantry frame 13, nozzle 14, polishing tank 15, component to be polished 16, fixture 17, gantry machine tool base 18, Second axial guide rail 19, workbench 20, fifth pipeline 21, sixth pipeline 22, cleaning device 23, first diverter valve 24, second two-position three-way control valve 25, second diverter valve 26 , the seventh pipeline 27, lifting device 28, la...