Novel low temperature plasma preparation process for superhydrophobic white carbon black
A technology of low-temperature plasma and low-temperature plasma, which is applied in the treatment of dyed low-molecular organic compounds and fibrous fillers, etc., can solve the problems of difficult practical application and high equipment requirements, so as to ensure product quality, reduce industrial costs, and prevent collapse and damage Effect
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Embodiment 1
[0025] Put 20g of white carbon black into the low-temperature plasma device; vaporize the modifier at 100°C and mix it with He with a flow rate of 120ml / min; pass the mixed gas into the low-temperature plasma device, the plasma discharge mode For corona discharge, the plasma discharge power is 10W, start the device, react for 60min, and the temperature is 50°C. Repeat the above steps three times. The effects of different modifiers on the properties of hydrophobic silica are shown in Table 1.
[0026] Table 1 Effect of different modifiers on the properties of hydrophobic silica
[0027] Modifier type
Embodiment 2
[0029] Put 20g of white carbon black into the low-temperature plasma device; vaporize glycerol at 100°C and mix it with a carrier gas with a flow rate of 120ml / min; pass the mixed gas into the low-temperature plasma device, and the plasma discharge The method is corona discharge, the plasma discharge power is 10W, the device is started, the reaction is 60min, and the temperature is 50°C. Repeat the above steps three times. The effects of different carrier gases on the properties of hydrophobic silica are shown in Table 2.
[0030] Table 2 Effect of different carrier gases on the properties of hydrophobic silica
[0031] Type of carrier gas
Embodiment 3
[0033] Put 20g of white carbon black into the low-temperature plasma device; vaporize glycerol at a certain temperature and mix it with He with a flow rate of 120ml / min; pass the mixed gas into the low-temperature plasma device, and the plasma discharge method For corona discharge, the plasma discharge power is 10W, start the device, react for 60min, and the temperature is 50°C. Repeat the above steps three times. The effects of different vaporization temperatures on the properties of hydrophobic silica are shown in Table 3.
[0034] Table 3 Effect of different vaporization temperatures on the properties of hydrophobic silica
[0035] Vaporization temperature (℃)
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