Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A new low-temperature plasma preparation process of superhydrophobic silica

A technology of low-temperature plasma and low-temperature plasma, which is applied in the treatment of dyed low-molecular organic compounds, fibrous fillers, etc., can solve the problems of difficult practical application and high equipment requirements, and achieve product quality assurance, industrial cost reduction, and simple process Effect

Active Publication Date: 2020-09-08
SHENZHEN LOTUT INNOVATION DESIGN CO LTD
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, it has been reported in the literature that hydrophobic silica can be prepared by ethanol supercritical technology. Although the production process of this method is simple and the consumption of modifiers is small, the entire preparation process needs to be carried out under high temperature and high pressure, and the requirements for equipment are also higher. Therefore, it is difficult to be used in practical applications

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A new low-temperature plasma preparation process of superhydrophobic silica

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Put 20g of white carbon black into the low-temperature plasma device; vaporize the modifier at 100°C and mix it with He with a flow rate of 120ml / min; pass the mixed gas into the low-temperature plasma device, the plasma discharge mode For corona discharge, the plasma discharge power is 10W, start the device, react for 60min, and the temperature is 50°C. Repeat the above steps three times. The effects of different modifiers on the properties of hydrophobic silica are shown in Table 1.

[0026] Table 1 Effect of different modifiers on the properties of hydrophobic silica

[0027] Modifier type Static water contact angle (°) ethanol 135.7 Ethylene glycol 138.7 Butanol 142.7 Glycerol 143.7 Ethyl chloride 139.0 Dichloroethane 140.9 Monochloropropane 142.6 Ethylene glycol + monochloropropane 144.7 Ethanol + Dichloroethane 141.2 Glycerol + monochloropropane 143.8

Embodiment 2

[0029] Put 20g of white carbon black into the low-temperature plasma device; vaporize glycerol at 100°C and mix it with a carrier gas with a flow rate of 120ml / min; pass the mixed gas into the low-temperature plasma device, and the plasma discharge The method is corona discharge, the plasma discharge power is 10W, the device is started, the reaction is 60min, and the temperature is 50°C. Repeat the above steps three times. The effects of different carrier gases on the properties of hydrophobic silica are shown in Table 2.

[0030] Table 2 Effect of different carrier gases on the properties of hydrophobic silica

[0031] Type of carrier gas Static water contact angle (°) Ar 142.8 he 143.7 N2 142.1

Embodiment 3

[0033] Put 20g of white carbon black into the low-temperature plasma device; vaporize glycerol at a certain temperature and mix it with He with a flow rate of 120ml / min; pass the mixed gas into the low-temperature plasma device, and the plasma discharge method For corona discharge, the plasma discharge power is 10W, start the device, react for 60min, and the temperature is 50°C. Repeat the above steps three times. The effects of different vaporization temperatures on the properties of hydrophobic silica are shown in Table 3.

[0034] Table 3 Effect of different vaporization temperatures on the properties of hydrophobic silica

[0035] Vaporization temperature (℃) Static water contact angle (°) 50 142.9 100 143.7 150 143.9 200 144.2

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a novel low temperature plasma preparation process for superhydrophobic white carbon black. The novel low temperature plasma preparation process comprises the following steps:putting hydrophobic white carbon black into a low temperature plasma device; mixing a vaporized modifier with carrier gas with certain flow velocity and introducing a mixture into the low temperatureplasma device; and discharging and starting a low temperature plasma for a period of time at certain power to obtain the hydrophobic white carbon black. The novel low temperature plasma preparation process disclosed by the invention can be realized by adopting a low temperature plasma technology without high temperature or high voltage, and can effectively prevent collapse and damage of a nanochannel and ensure the quality of a product; and meanwhile, the process is simple, green and environmentally-friendly.

Description

technical field [0001] The invention relates to the field of material preparation, in particular to a new preparation process of a superhydrophobic white carbon black material. Background technique [0002] Hydrophobic silica is a kind of porous amorphous silica, in the form of white powder, its primary particle size is nano-particles, and the final particle size is 2-3 μm. After it is mixed with rubber, plastic, and paint, it can make the product have various A good physical properties. In rubber products, hydrophobic silica can not only reduce the amount of rubber used, reduce costs, but also improve the hardness, wear resistance, and reduce deformation of rubber products; in ink products, hydrophobic silica is a good thickener ; In coating products, hydrophobic silica has excellent high temperature resistance and extinction performance. Therefore, hydrophobic silica is widely used in industries such as rubber, plastics, tanning, paint, and sports and cultural products. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C09C1/30C09C3/08
CPCC09C1/3063C09C3/08
Inventor 王卉曹莹莹陈丹丹邓兴宇陈泽文
Owner SHENZHEN LOTUT INNOVATION DESIGN CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products